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Alfred Ludwig

Researcher at Ruhr University Bochum

Publications -  321
Citations -  8926

Alfred Ludwig is an academic researcher from Ruhr University Bochum. The author has contributed to research in topics: Thin film & Sputter deposition. The author has an hindex of 38, co-authored 301 publications receiving 6699 citations. Previous affiliations of Alfred Ludwig include Center of Advanced European Studies and Research.

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Oxygen and hydrogen evolution reactions on Ru, RuO2, Ir, and IrO2 thin film electrodes in acidic and alkaline electrolytes: A comparative study on activity and stability

TL;DR: In this paper, the authors evaluated the stability and activity of iridium and ruthenium thin film electrodes in acidic and alkaline electrolytes using an electrochemical scanning flow cell (SFC) connected to an inductively coupled plasma mass spectrometer (ICP-MS).
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Combinatorial search of thermoelastic shape-memory alloys with extremely small hysteresis width

TL;DR: A clear relationship between the hysteresis and the middle eigenvalue of the transformation stretch tensor as predicted by the theory was observed for the first time and a new composition region of titanium-rich SMAs is identified with potential for improved control of SMA properties.
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The 2019 materials by design roadmap

TL;DR: In this paper, the authors present an overview of the current state of computational materials prediction, synthesis and characterization approaches, materials design needs for various technologies, and future challenges and opportunities that must be addressed.