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Dong Myong Kim

Researcher at Kookmin University

Publications -  233
Citations -  4036

Dong Myong Kim is an academic researcher from Kookmin University. The author has contributed to research in topics: Thin-film transistor & Threshold voltage. The author has an hindex of 25, co-authored 216 publications receiving 3378 citations.

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Proceedings ArticleDOI

High performance amorphous oxide thin film transistors with self-aligned top-gate structure

TL;DR: In this paper, a self-aligned top-gate amorphous oxide TFTs for large size and high resolution displays are presented, where Ar plasma is exposed on the source/drain region of active layer to minimize the source and drain series resistances.
Journal ArticleDOI

Extraction of Subgap Density of States in Amorphous InGaZnO Thin-Film Transistors by Using Multifrequency Capacitance–Voltage Characteristics

TL;DR: In this paper, an extraction technique for subgap density of states (DOS) in an n-channel amorphous InGaZnO thin-film transistor (TFT) by using multifrequency capacitancevoltage (C -V) characteristics is proposed and verified by comparing the measured I-V characteristics with the technology computer-aided design simulation results incorporating the extracted DOS as parameters.
Journal ArticleDOI

Photonic high-frequency capacitance-voltage characterization of interface states in metal-oxide-semiconductor capacitors

TL;DR: In this paper, a photonic high-frequency capacitance-voltage (HF C-V) response of metal-oxide semiconductor (MOS) capacitors is reported for the analysis of interface states in MOS systems.
Journal ArticleDOI

Transparent, Flexible Strain Sensor Based on a Solution-Processed Carbon Nanotube Network.

TL;DR: A sandwich-like structured strain sensor with excellent optical transparency based on highly purified, solution-processed, 99% metallic CNT-polydimethylsiloxane (PDMS) composite thin films that can be applied and controlled based on the need of individual applications.
Journal ArticleDOI

Modeling of amorphous InGaZnO thin-film transistors based on the density of states extracted from the optical response of capacitance-voltage characteristics

TL;DR: In this paper, the acceptor-like density of states (DOS) is extracted from the optical response of capacitance-voltage characteristics and confirmed by the TCAD simulation comparing with the measured data.