T
Tsunenobu Kimoto
Researcher at Kyoto University
Publications - 635
Citations - 15807
Tsunenobu Kimoto is an academic researcher from Kyoto University. The author has contributed to research in topics: Silicon carbide & Diode. The author has an hindex of 58, co-authored 622 publications receiving 13668 citations. Previous affiliations of Tsunenobu Kimoto include Eötvös Loránd University & Sumitomo Electric Industries.
Papers
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Journal ArticleDOI
Hydrogen Implantation and Annealing-Induced Exfoliation Process in SiC Wafers with Various Crystal Orientations
TL;DR: In this article, the influence of time and temperature on the blistering rate of 4H-SiC wafers with various orientations, on-axis and 8° off-axis (0001), (1100), and (1120).
Proceedings ArticleDOI
Estimation of Impact Ionization Coefficient in GaN by Photomulitiplication Measurement Utilizing Franz-Keldysh Effect
Takuya Maeda,Tetsuo Narita,Hiroyuki Ueda,Masakazu Kanechika,Tsutomu Uesugi,Tetsu Kachi,Tsunenobu Kimoto,Masahiro Horita,Jun Suda +8 more
TL;DR: In this article, the authors investigated the valanche multiplication characteristics in GaN p-n junction diodes under high reverse bias conditions and showed that the photocurrent induced by the Franz-Keldysh effect can be well reproduced by the theoretical calculations of the optical absorption, and their avalanche multiplications were observed.
Journal ArticleDOI
Phonon frequencies of a highly strained AlN layer coherently grown on 6H-SiC (0001)
TL;DR: In this paper, the phonon frequencies of a high-quality AlN layer coherently grown on a 6H-SiC (0001) substrate are investigated by Raman scattering.
Journal ArticleDOI
High-Speed Growth of High-Purity Epitaxial Layers with Specular Surface on 4H-SiC(000-1) Face
TL;DR: In this article, an off-axis 4H-SiC (000-1) epilayer with a specular surface was used for homoepitaxy and homo-epitaxial growth in a SiH4-C3H8-H2 system.
Journal ArticleDOI
Shallow Defects Observed in As-Grown and Electron-Irradiated or He+-Implanted Al-Doped 4H-SiC Epilayers
Svetlana Beljakowa,Sergey A. Reshanov,Bernd Zippelius,Michael Krieger,Gerhard Pensl,Katsunori Danno,Tsunenobu Kimoto,Shinobu Onoda,Takeshi Ohshima,Fei Yan,Robert P. Devaty,Wolfgang J. Choyke +11 more
TL;DR: In this article, a defect center was found in a box-shaped He+-profile of a 4H-SiC epilayer, which is not directly formed by He+implantation, but requires an annealing process.