scispace - formally typeset
T

Tsunenobu Kimoto

Researcher at Kyoto University

Publications -  635
Citations -  15807

Tsunenobu Kimoto is an academic researcher from Kyoto University. The author has contributed to research in topics: Silicon carbide & Diode. The author has an hindex of 58, co-authored 622 publications receiving 13668 citations. Previous affiliations of Tsunenobu Kimoto include Eötvös Loránd University & Sumitomo Electric Industries.

Papers
More filters
Journal ArticleDOI

Reduction of interface state density in SiC (0001) MOS structures by low-oxygen-partial-pressure annealing

TL;DR: In this paper, annealing in low-oxygen-partial-pressure (low-p O2) ambient is reported to reduce the interface state density (D IT) at a SiC (0001)/SiO2 interface near the conduction band edge (E C) of SiC.
Journal ArticleDOI

Passivation of Surface Recombination at the Si-Face of 4H-SiC by Acidic Solutions

TL;DR: In this article, the authors carried out carrier lifetime measurements for 4H-SiC single crystals in aqueous solutions with various pH by the microwave photoconductivity decay method.
Proceedings ArticleDOI

27.5 kV 4H-SiC PiN diode with space-modulated JTE and carrier injection control

TL;DR: In this paper, the authors investigated the effect of carrier lifetime on electrical characteristics of a 4H-SiC PiN diode with a space-modulated junction termination extension and carrier injection control.
Journal ArticleDOI

E1/E2 traps in 6H-SiC studied with Laplace deep level transient spectroscopy

Abstract: Electrically active defects in n-type 6H-SiC diode structures have been studied by deep level transient spectroscopy (DLTS) and high-resolution Laplace DLTS. It is shown that the commonly observed broadened DLTS peak previously ascribed to two traps referenced as E1/E2 has three components with activation energies for electron emission of 0.39, 0.43, and 0.44 eV. Further, defects associated with these emission signals have similar electronic structure, each possessing two energy levels with negative-U ordering in the upper half of the 6H-SiC gap. It is argued that the defects are related to a carbon vacancy at three non-equivalent lattice sites in 6H-SiC.
Journal ArticleDOI

Suppression of Punch-Through Current in 3 kV 4H-SiC Reverse-Blocking MOSFET by Using Highly Doped Drift Layer

TL;DR: In this article, a non-punch-through (NPT) drift layer was used to suppress the punch-through current under the reverse-blocking condition, and the NPT drift layer achieved a differential specific on-resistance of 13.5 µm at room temperature, which was 33% lower than that of a 3 kV PT RB MOSFET.