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Journal ArticleDOI

Analytical model and characterization of small-geometry buried-channel depletion MOSFETs

T. Yamaguchi, +1 more
- 01 Dec 1983 - 
- Vol. 18, Iss: 6, pp 784-793
TLDR
Small-geometry buried-channel depletion MOSFETs (BCD-MOSFets) are characterized based on an analytical model that includes short-channel, narrow- channel, and carrier-velocity saturation effects andoretical results on drain current are in good agreement with experimental results.
Abstract
Small-geometry buried-channel depletion MOSFETs (BCD-MOSFETs) are characterized based on an analytical model that includes short-channel, narrow-channel, and carrier-velocity saturation effects. The drain current is calculated based on the surface electrons induced by the gate-bias voltage and the buried-channel junction FET. The narrow-channel effect is modeled not only by the additional depletion-layer charges created by a fringing-field effect in the field region, but also by the effective channel width as a function of gate-bias voltage. Surface-electron mobility is modeled as a function of the vertical and lateral electrical fields created by the gate-bias and drain voltages, while bulk-electron mobility is described as a function of the lateral electric field due to the drain voltage. Theoretical results on drain current are in good agreement with experimental results.

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Citations
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Journal ArticleDOI

Analysis of the depletion-mode MOSFET including diffusion and drift currents

TL;DR: In this paper, a four-terminal model for a long-channel depletion-mode MOS transistor including both the diffusion and the drift components of the current along the channel is developed.
Journal ArticleDOI

Experimental Study on Electron Mobility in Accumulation-Mode Silicon-on-Insulator Metal--Oxide--Semiconductor Field-Effect Transistors

TL;DR: In this paper, the authors investigated the physical mechanisms of higher mobility in junctionless silicon-on-insulator (SOI) MOSFETs with a channel doping concentration of 1×1017 cm-3 and an SOI body thickness of 48 nm.
Journal ArticleDOI

Simple analytical expressions for the fringing field and fringing-field-induced transfer time in charge-coupled devices

TL;DR: In this paper, the authors present simple analytical solutions for the potential and the fringing field, especially for charge-coupled devices (CCDs), for finding expressions for the optimal charge transport depth and charge transfer time for small charge packets in CCDs.
Journal ArticleDOI

A Predictor/CAD Model for Buried-Channel MOS Transistors

TL;DR: An analytical predictor/CAD model can be used to predict the anomalous threshold voltage shift associated with the short-channel buried-channel MOSFET and a charge model for the intrinsic buried- channel device is formulated.
Journal ArticleDOI

Mobility models for the I–V characteristics of buried-channel MOSFETs

TL;DR: In this paper, two separate carrier-mobility models for the I-V characteristics of buried-channel MOSFETs are presented, one model considers oxide-semiconductor interface scattering for carrier motion in the surface accumulation layer; the other model considers the scattering of carrier motion within the finite thickness of the neutral buried channel.
References
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Journal ArticleDOI

A simple theory to predict the threshold voltage of short-channel IGFET's

TL;DR: A simple expression for the threshold voltage of an IGFET is derived from a charge conservation principle which geometrically takes into account two-dimensional edge effects in this paper, which is valid for short and long-channel lengths.
Journal ArticleDOI

Electron Mobility in Inversion and Accumulation Layers on Thermally Oxidized Silicon Surfaces

TL;DR: An extensive set experimental results on the behavior of electron surface mobility in thermally oxidized silicon structures are presented and empirical equations are developed which allow the calculation of electron mobility under a wide variety of substrate, process, and electrical conditions.
Journal ArticleDOI

Field-dependent mobility model for two-dimensional numerical analysis of MOSFET's

TL;DR: In this paper, a field-dependent mobility model for use in two-dimensional numerical analysis of MOSFET's is proposed, which takes into account two field components: one is the gate field which induces carriers in the inversion layer and the other is the drain field which transports carriers to the drain.
Journal ArticleDOI

Modeling of an ion-implanted silicon-gate depletion-mode IGFET

TL;DR: In this article, a dc model is presented for the ion-implemented silicon-gate depletion-mode IGFET from which the device terminal behavior can be determined, based on the concept of a finite semiconductor capacitance in the channel region whereby the depth of the implanted channel is taken into account.
Journal ArticleDOI

MINIMOS - A Two-Dimensional MOS Transistor Analyzer

TL;DR: A user-oriented software tool-MINIMOS-for the two-dimensional numerical simulation of planar MOS transistors, which is able to calculate the doping profiles from the technological parameters specified by the user.
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