Journal ArticleDOI
Block copolymer based nanostructures: materials, processes, and applications to electronics.
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A comparison study of how three different approaches to placement control of block Copolymer Ordering in Thin Films changed the quality of the films they produced.Abstract:
2.4. Block Copolymer Containing Hybrids 151 3. Block Copolymer Ordering in Thin Films 153 3.1. General Process Steps 153 3.2. Morphology of Thin Films 154 3.3. Thickness-Dependent Nanopatterning 154 3.3.1. Ultrathin Films: Monomolecular Films 155 3.3.2. Sub-L0 Thick Films 155 3.3.3. Thick Films 157 3.4. Placement Control: Directed Self-Assembly (DSA) 162 3.4.1. Topographic Guiding Patterns: Graphoepitaxy 163read more
Citations
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Templated Techniques for the Synthesis and Assembly of Plasmonic Nanostructures
Journal ArticleDOI
Functional block copolymers: nanostructured materials with emerging applications.
TL;DR: This Review illustrates recent progress in the field of block copolymer materials by highlighting selected emerging applications by highlightingselected emerging applications.
Journal ArticleDOI
Block Copolymer Lithography
Christopher M. Bates,Michael J. Maher,Dustin W. Janes,Christopher J. Ellison,C. Grant Willson +4 more
TL;DR: In this article, the current state of block copolymer lithography and key challenges and opportunities within the field are discussed, focusing on advances and issues related to thermal annealing.
Journal ArticleDOI
Solvent Vapor Annealing of Block Polymer Thin Films
TL;DR: In this paper, the authors provide a critical analysis of the current knowledge concerning solvent vapor annealing (SVA) of block polymer thin films and identify key challenges that will be important to overcome for future development of SVA as a practical, reliable, and universal technique for the valorization of block polymers in a wide range of technologies.
Journal ArticleDOI
o-Nitrobenzyl Alcohol Derivatives: Opportunities in Polymer and Materials Science
TL;DR: The use of o-nitrobenzyl group (o-NB) in polymer chemistry has been extensively studied in this article, including the use of O-NB-based cross-linkers for photodegradable hydrogels, o-NB side chain functionalization in (block) copolymers, and oNB functionalization for thin film patterning for self-assembled monolayers.
References
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Journal ArticleDOI
Thin Film Morphologies of ABC Triblock Copolymers Prepared from Solution
TL;DR: In this paper, the thin film morphologies of polystyrene-b-poly(2-vinylpyridine) diblock copolymers were studied after "annealing" in the vapor of different solvents.
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High-capacity, self-assembled metal-oxide-semiconductor decoupling capacitors
Charles T. Black,Kathryn W. Guarini,Ying Zhang,H. Kim,J. Benedict,E. Sikorski,Inna V. Babich,Keith Raymond Milkove +7 more
TL;DR: In this paper, the authors combine nanometer-scale polymer self assembly with advanced semiconductor microfabrication to produce metaloxide-semiconductor (MOS) capacitors with accumulation capacitance more than 400% higher than planar devices of the same lateral area.
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Observation of Perpendicular Orientation in Symmetric Diblock Copolymer Thin Films on Rough Substrates
Journal Article
Patternable block copolymers
TL;DR: A review of the chemical and physical nature of patternable block copolymers and their use as templates for functional nanostructures can be found in this paper, where a procedure for achieving long-range control of microdomain pattern orientation as well as the combination of top-down and bottom-up patterning to give multilevel control of blockcopolymer films are extensively discussed.
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Molecular weight dependence of lamellar domain spacing of diblock copolymers in bulk
TL;DR: In this paper, the lamellar domain spacing-molecular weight relationship of the diblock copolymer in bulk is given by D = 0.33 7 M 0.64 over the molecular weight range from 38 K to 740 K.