Journal ArticleDOI
Block copolymer based nanostructures: materials, processes, and applications to electronics.
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A comparison study of how three different approaches to placement control of block Copolymer Ordering in Thin Films changed the quality of the films they produced.Abstract:
2.4. Block Copolymer Containing Hybrids 151 3. Block Copolymer Ordering in Thin Films 153 3.1. General Process Steps 153 3.2. Morphology of Thin Films 154 3.3. Thickness-Dependent Nanopatterning 154 3.3.1. Ultrathin Films: Monomolecular Films 155 3.3.2. Sub-L0 Thick Films 155 3.3.3. Thick Films 157 3.4. Placement Control: Directed Self-Assembly (DSA) 162 3.4.1. Topographic Guiding Patterns: Graphoepitaxy 163read more
Citations
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Templated Techniques for the Synthesis and Assembly of Plasmonic Nanostructures
Journal ArticleDOI
Functional block copolymers: nanostructured materials with emerging applications.
TL;DR: This Review illustrates recent progress in the field of block copolymer materials by highlighting selected emerging applications by highlightingselected emerging applications.
Journal ArticleDOI
Block Copolymer Lithography
Christopher M. Bates,Michael J. Maher,Dustin W. Janes,Christopher J. Ellison,C. Grant Willson +4 more
TL;DR: In this article, the current state of block copolymer lithography and key challenges and opportunities within the field are discussed, focusing on advances and issues related to thermal annealing.
Journal ArticleDOI
Solvent Vapor Annealing of Block Polymer Thin Films
TL;DR: In this paper, the authors provide a critical analysis of the current knowledge concerning solvent vapor annealing (SVA) of block polymer thin films and identify key challenges that will be important to overcome for future development of SVA as a practical, reliable, and universal technique for the valorization of block polymers in a wide range of technologies.
Journal ArticleDOI
o-Nitrobenzyl Alcohol Derivatives: Opportunities in Polymer and Materials Science
TL;DR: The use of o-nitrobenzyl group (o-NB) in polymer chemistry has been extensively studied in this article, including the use of O-NB-based cross-linkers for photodegradable hydrogels, o-NB side chain functionalization in (block) copolymers, and oNB functionalization for thin film patterning for self-assembled monolayers.
References
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Journal ArticleDOI
Preparation and Characterization of a Styrene−Isoprene Undecablock Copolymer and Its Hierarchical Microdomain Structure in Bulk
TL;DR: A two-component multiblock copolymer with undecablock two of them on both chain ends are long and nine of them are short was successfully prepared by anionic polymerization using the six-step sequential monomer addition technique as mentioned in this paper.
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Role of Molecular Architecture in Mechanical Failure of Glassy/Semicrystalline Block Copolymers: CEC vs CECEC Lamellae
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Nanophase-separated synchronizing structure with parallel double periodicity from an undecablock terpolymer.
TL;DR: A new nanophase-separated structure with parallel double periodicity has been identified for an undecablock terpolymer in bulk, which exhibits a hierarchical lamellar structure with two crystallographic periods.
Journal ArticleDOI
High Aspect‐Ratio Cylindrical Nanopore Arrays and Their Use for Templating Titania Nanoposts
Oun-Ho Park,Joy Cheng,Mark W. Hart,Teya Topuria,Philip M. Rice,Leslie E. Krupp,Robert D. Miller,Hiroshi Ito,Ho-Cheol Kim +8 more
Journal ArticleDOI
Nanopattern of Diblock Copolymers Selectively Adsorbed on a Plane Surface
Potemkin,Elena Yu. Kramarenko,Alexei R. Khokhlov,Roland G. Winkler,Peter Reineker,P. Eibeck,Joachim P. Spatz,Martin Möller +7 more
TL;DR: In this paper, surface interaction controlled microphase separation leading to the formation of chemically heterogeneous surface nanopatterns in dry ultrathin films of A−B diblock copolymers is studied experimentally and theoretically in the strong segregation limit.