scispace - formally typeset
Journal ArticleDOI

Block copolymer based nanostructures: materials, processes, and applications to electronics.

Ho-Cheol Kim, +2 more
- 01 Jan 2010 - 
- Vol. 110, Iss: 1, pp 146-177
Reads0
Chats0
TLDR
A comparison study of how three different approaches to placement control of block Copolymer Ordering in Thin Films changed the quality of the films they produced.
Abstract
2.4. Block Copolymer Containing Hybrids 151 3. Block Copolymer Ordering in Thin Films 153 3.1. General Process Steps 153 3.2. Morphology of Thin Films 154 3.3. Thickness-Dependent Nanopatterning 154 3.3.1. Ultrathin Films: Monomolecular Films 155 3.3.2. Sub-L0 Thick Films 155 3.3.3. Thick Films 157 3.4. Placement Control: Directed Self-Assembly (DSA) 162 3.4.1. Topographic Guiding Patterns: Graphoepitaxy 163

read more

Citations
More filters
Journal ArticleDOI

Functional block copolymers: nanostructured materials with emerging applications.

TL;DR: This Review illustrates recent progress in the field of block copolymer materials by highlighting selected emerging applications by highlightingselected emerging applications.
Journal ArticleDOI

Block Copolymer Lithography

TL;DR: In this article, the current state of block copolymer lithography and key challenges and opportunities within the field are discussed, focusing on advances and issues related to thermal annealing.
Journal ArticleDOI

Solvent Vapor Annealing of Block Polymer Thin Films

TL;DR: In this paper, the authors provide a critical analysis of the current knowledge concerning solvent vapor annealing (SVA) of block polymer thin films and identify key challenges that will be important to overcome for future development of SVA as a practical, reliable, and universal technique for the valorization of block polymers in a wide range of technologies.
Journal ArticleDOI

o-Nitrobenzyl Alcohol Derivatives: Opportunities in Polymer and Materials Science

TL;DR: The use of o-nitrobenzyl group (o-NB) in polymer chemistry has been extensively studied in this article, including the use of O-NB-based cross-linkers for photodegradable hydrogels, o-NB side chain functionalization in (block) copolymers, and oNB functionalization for thin film patterning for self-assembled monolayers.
References
More filters
Journal ArticleDOI

Block copolymer lithography: Periodic arrays of ~1011 holes in 1 square centimeter

TL;DR: In this paper, dense periodic arrays of holes and dots have been fabricated in a silicon nitride-coated silicon wafer and transferred directly to the underlying silicon oxide layer by two complementary techniques.
Journal ArticleDOI

Epitaxial self-assembly of block copolymers on lithographically defined nanopatterned substrates

TL;DR: The integration of thin films of block copolymer with advanced lithographic techniques to induce epitaxial self-assembly of domains are demonstrated and illustrate how hybrid strategies to nanofabrication allow for molecular level control in existing manufacturing processes.
Journal ArticleDOI

Enabling nanotechnology with self assembled block copolymer patterns

TL;DR: In this paper, a review of the current efforts to utilize block copolymers in nanotechnologies including nanostructured membranes, BCP templates for nanoparticle synthesis, photonic crystals, and high-density information storage media is presented.
Journal ArticleDOI

Continuous formation of supported cubic and hexagonal mesoporous films by sol–gel dip-coating

TL;DR: In this article, a solgel-based dip-coating method for the rapid synthesis of continuous mesoporous thin films on a solid substrate is presented, which can be used for membrane-based separations, selective catalysis and sensors.
Journal ArticleDOI

Controlling Polymer-Surface Interactions with Random Copolymer Brushes

TL;DR: In this article, a simple technique for precisely controlling the interfacial energies and wetting behavior of polymers in contact with solid surfaces is described, where end-functionalized statistical random copolymers of styrene and methylmethacrylate are synthesized, with the styrene fraction f varying from 0 to 1, and were end-grafted onto silicon substrates to create random polymers about 5 nanometers thick.
Related Papers (5)