Journal ArticleDOI
Block copolymer based nanostructures: materials, processes, and applications to electronics.
Reads0
Chats0
TLDR
A comparison study of how three different approaches to placement control of block Copolymer Ordering in Thin Films changed the quality of the films they produced.Abstract:
2.4. Block Copolymer Containing Hybrids 151 3. Block Copolymer Ordering in Thin Films 153 3.1. General Process Steps 153 3.2. Morphology of Thin Films 154 3.3. Thickness-Dependent Nanopatterning 154 3.3.1. Ultrathin Films: Monomolecular Films 155 3.3.2. Sub-L0 Thick Films 155 3.3.3. Thick Films 157 3.4. Placement Control: Directed Self-Assembly (DSA) 162 3.4.1. Topographic Guiding Patterns: Graphoepitaxy 163read more
Citations
More filters
Journal ArticleDOI
Photoinduced optical anisotropy in azobenzene containing block copolymer–homopolymer blends. Influence of microstructure and molecular weight
Cristina Berges,Nélida Gimeno,Luis Oriol,Milagros Piñol,Patricia Forcén,Carlos Sánchez,Rafael Alcalá +6 more
TL;DR: In this paper, the photo-induced birefringence normalized to the azo content has been found in two diblock methacrylic azo polymers and in some of their blends with PMMA of different molecular weights as well as their photoinduced anisotropy.
Journal ArticleDOI
Ordering block copolymers with structured electrodes
Ulrich Welling,Marcus Müller +1 more
TL;DR: It is demonstrated that a combination of graphoepitaxy and a homogeneous electric field extends the maximal distance between the topographical guiding patterns that result in defect-free ordering compared to graphoEPitaxy alone.
Journal ArticleDOI
Solvent-induced morphological transitions in methacrylate-based block-copolymer aggregates
TL;DR: The results disclose the fascinating potential of PEO-b-PBMA copolymers for the templated synthesis of nanostructured materials and offer a guideline to fine-tune their properties by accurately selecting the THF/water ratio.
Journal ArticleDOI
Contact holes patterning by directed self-assembly of block copolymers: process window study
Ahmed Gharbi,Raluca Tiron,Maxime Argoud,Xavier Chevalier,Patricia Pimenta Barros,Celia Nicolet,Christophe Navarro +6 more
TL;DR: In this paper, a process window for directed self-assembly (DSA) of polystyrene-b-polymethylmethacrylate block copolymers (BCPs) is determined as a function of guiding pattern dimensions and BCP molecular weights corresponding to BCP natural periods.
Journal ArticleDOI
Hybrid line–dot nanopatterns from directed self-assembly of diblock copolymers by trenches
Wenfeng Zhao,Chao Duan,Weihua Li +2 more
TL;DR: It is demonstrated that the directed self-assembly of AB diblock copolymers by periodic trenches can be used to fabricate large-scale ordered hybrid line-dot nanopatterns in addition to a defect-free dot nanop attern, confirming their feasibility in kinetics.
References
More filters
Journal ArticleDOI
Ordered mesoporous molecular sieves synthesized by a liquid-crystal template mechanism
TL;DR: In this paper, the synthesis of mesoporous inorganic solids from calcination of aluminosilicate gels in the presence of surfactants is described, in which the silicate material forms inorganic walls between ordered surfactant micelles.
Journal ArticleDOI
Block Copolymer Thermodynamics: Theory and Experiment
TL;DR: Block copolymers are macromolecules composed of sequences, or blocks, of chemically distinct repeat units that make possible the sequential addition of monomers to various carbanion-ter minated ("living") linear polymer chains.
Journal ArticleDOI
Block Copolymers—Designer Soft Materials
TL;DR: The Knitting Pattern as mentioned in this paper is a block copolymer that was discovered by Reimund Stadler and his coworkers and reflects a delicate free-energy minimization that is common to all blockcopolymer materials.
Journal ArticleDOI
Ultrahigh-Density Nanowire Arrays Grown in Self-Assembled Diblock Copolymer Templates
Thomas Thurn-Albrecht,Joerg Schotter,G. A. Kästle,N. Emley,Takasada Shibauchi,Takasada Shibauchi,Lia Krusin-Elbaum,Kathryn W. Guarini,Charles T. Black,Mark T. Tuominen,Thomas P. Russell +10 more
TL;DR: A simple, robust, chemical route to the fabrication of ultrahigh-density arrays of nanopores with high aspect ratios using the equilibrium self-assembled morphology of asymmetric diblock copolymers is shown.