Journal ArticleDOI
Block copolymer based nanostructures: materials, processes, and applications to electronics.
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TLDR
A comparison study of how three different approaches to placement control of block Copolymer Ordering in Thin Films changed the quality of the films they produced.Abstract:
2.4. Block Copolymer Containing Hybrids 151 3. Block Copolymer Ordering in Thin Films 153 3.1. General Process Steps 153 3.2. Morphology of Thin Films 154 3.3. Thickness-Dependent Nanopatterning 154 3.3.1. Ultrathin Films: Monomolecular Films 155 3.3.2. Sub-L0 Thick Films 155 3.3.3. Thick Films 157 3.4. Placement Control: Directed Self-Assembly (DSA) 162 3.4.1. Topographic Guiding Patterns: Graphoepitaxy 163read more
Citations
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Journal ArticleDOI
Templated Techniques for the Synthesis and Assembly of Plasmonic Nanostructures
Journal ArticleDOI
Functional block copolymers: nanostructured materials with emerging applications.
TL;DR: This Review illustrates recent progress in the field of block copolymer materials by highlighting selected emerging applications by highlightingselected emerging applications.
Journal ArticleDOI
Block Copolymer Lithography
Christopher M. Bates,Michael J. Maher,Dustin W. Janes,Christopher J. Ellison,C. Grant Willson +4 more
TL;DR: In this article, the current state of block copolymer lithography and key challenges and opportunities within the field are discussed, focusing on advances and issues related to thermal annealing.
Journal ArticleDOI
Solvent Vapor Annealing of Block Polymer Thin Films
TL;DR: In this paper, the authors provide a critical analysis of the current knowledge concerning solvent vapor annealing (SVA) of block polymer thin films and identify key challenges that will be important to overcome for future development of SVA as a practical, reliable, and universal technique for the valorization of block polymers in a wide range of technologies.
Journal ArticleDOI
o-Nitrobenzyl Alcohol Derivatives: Opportunities in Polymer and Materials Science
TL;DR: The use of o-nitrobenzyl group (o-NB) in polymer chemistry has been extensively studied in this article, including the use of O-NB-based cross-linkers for photodegradable hydrogels, o-NB side chain functionalization in (block) copolymers, and oNB functionalization for thin film patterning for self-assembled monolayers.
References
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PatentDOI
Density multiplication and improved lithography by directed block copolymer assembly
Paul F. Nealey,Huiman Kang,François Detcheverry,Juan J. Depablo,Ricardo Ruiz,Thomas R. Albrecht +5 more
TL;DR: In this article, a method to pattern a substrate with dense periodic nanostructures that combine top-down lithographic tools and self-assembling block copolymer materials is described.
Journal ArticleDOI
Directing the self-assembly of block copolymers
TL;DR: A review of block copolymers can be found in this paper, which summarizes existing applications and alignment techniques and provides an outlook toward the future. But, with few exceptions, the alignment methods are general to a specific morphology or set of morphologies.
Journal ArticleDOI
Patterning with block copolymer thin films
TL;DR: In this article, the authors review a variety of mechanisms for gaining control over block copolymer order as well as many of the applications of these materials and the potential of perfecting long-range two-dimensional order over a broader range of length scales and the extension of these concepts to functional materials and more complex architectures.
Journal ArticleDOI
Directed assembly of block copolymer blends into nonregular device-oriented structures.
Mark P. Stoykovich,Marcus Müller,Sang Ouk Kim,Harun H. Solak,Erik Edwards,Juan J. de Pablo,Paul F. Nealey +6 more
TL;DR: Ternary blends of diblock copolymers and homopolymers that naturally form periodic arrays are directed to assemble into nonregular device-oriented structures on chemically nanopatterned substrates for defect-free assembly in locations where the domain dimensions deviate substantially from those formed in the bulk.