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Journal ArticleDOI

High performance organic field-effect transistors with ultra-thin HfO2 gate insulator deposited directly onto the organic semiconductor

TLDR
In this article, stable organic field effect transistors (OFETs) with an ultra-thin HfO2 gate insulator deposited directly on top of rubrene single crystals by atomic layer deposition (ALD) are presented.
Abstract
We have produced stable organic field-effect transistors (OFETs) with an ultra-thin HfO2 gate insulator deposited directly on top of rubrene single crystals by atomic layer deposition (ALD). We find that ALD is a gentle deposition process to grow thin films without damaging rubrene single crystals, as results these devices have a negligibly small threshold voltage and are very stable against gate-bias-stress, and the mobility exceeds 1 cm2/V s. Moreover, the devices show very little degradation even when kept in air for more than 2 months. These results demonstrate thin HfO2 layers deposited by ALD to be well suited as high capacitance gate dielectrics in OFETs operating at small gate voltage. In addition, the dielectric layer acts as an effective passivation layer to protect the organic semiconductor.

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Citations
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Journal ArticleDOI

Solution-processed high-k magnesium oxide dielectrics for low-voltage oxide thin-film transistors

TL;DR: In this article, a spincoating-based MgO dielectric transistor was fabricated using the spin-coating method and an optimized In2O3/MgO TFT exhibited an electron mobility of 5.48 cm2/V s.
Journal ArticleDOI

Solution-processed hafnium oxide dielectric thin films for thin-film transistors applications

TL;DR: Hafnium oxide (HfO x ) dielectric thin films were fabricated on heavily-doped silicon (100) substrates by a solution process The precursor solution was prepared by dissolving HfCl 4 in ethanol.
Journal ArticleDOI

Low operating voltage organic transistors and circuits with anodic titanium oxide and phosphonic acid self-assembled monolayer dielectrics

TL;DR: In this article, the authors fabricated organic thin-film transistors with sub-1 V driving voltage enabled by a hybrid dielectric comprising high-k amorphous titanium oxide (TiO x ) and a phosphonic acid self-assembled monolayer (SAM).
Journal ArticleDOI

Low-Temperature Fabrication of Robust, Transparent, and Flexible Thin-Film Transistors with a Nanolaminated Insulator.

TL;DR: A IGZO-based TFT with IAI electrodes and the 70 °C AM-laminated insulator was fabricated to evaluate robustness, transparency, flexibility, and process temperature, resulting in transfer characteristics comparable to those of an IGZo-basedTFT with a 150 °C Al2O3 insulator.
References
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Journal ArticleDOI

General observation of n-type field-effect behaviour in organic semiconductors

TL;DR: It is demonstrated that the use of an appropriate hydroxyl-free gate dielectric—such as a divinyltetramethylsiloxane-bis(benzocyclobutene) derivative (BCB; ref. 6)—can yield n-channel FET conduction in most conjugated polymers, revealing that electrons are considerably more mobile in these materials than previously thought.
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Elastomeric Transistor Stamps: Reversible Probing of Charge Transport in Organic Crystals

TL;DR: This method, which eliminates exposure of the fragile organic surface to the hazards of conventional processing, enables fabrication of rubrene transistors with charge carrier mobilities as high as ∼15 cm2/V·s and subthreshold slopes as low as 2nF·V/decade·cm2.
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Inkjet printing of single-crystal films

TL;DR: It is shown that mixing fine droplets of an antisolvent and a solution of an active semiconducting component within a confined area on an amorphous substrate can trigger the controlled formation of exceptionally uniform single-crystal or polycrystalline thin films that grow at the liquid–air interfaces.
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Ultralow-power organic complementary circuits

TL;DR: This work demonstrates an organic circuit with very low power consumption that uses a self-assembled monolayer gate dielectric and two different air-stable molecular semiconductors (pentacene and hexadecafluorocopperphthalocyanine, F16CuPc) to implement transistors, circuits, displays and sensors on arbitrary substrates.
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Crystallinity of inorganic films grown by atomic layer deposition: Overview and general trends

TL;DR: Puurunen et al. as discussed by the authors summarized the two-reactant ALD processes to grow inorganic materials developed to-date, updating the information of an earlier review on ALD.
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