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Practical surface analysis: By auger and x-ray photoelectron spectroscopy

David Briggs, +1 more
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The article was published on 1983-01-01 and is currently open access. It has received 4689 citations till now. The article focuses on the topics: Auger electron spectroscopy & X-ray photoelectron spectroscopy.

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Multiphase microstructures via confined precipitation and dissolution of vessel phases: Example of austenite in martensitic steel

TL;DR: In this article, a vessel microstructure design based on site-specific formation and confined dissolution of precipitated carbides or intermetallic phases is proposed to optimize the mechanical property profiles of advanced structural materials such as high strength steels at comparatively lean alloy compositions.
Journal ArticleDOI

N and Ar ion‐implantation effects in SiO2 films on Si single‐crystal substrates

TL;DR: In this paper, the chemistry of an argon ion-irradiated interface between an amorphous silicon dioxide film and a silicon single-crystal substrate was studied by determining the kind and depth distribution of compounds formed after nitrogen implantation at a depth more shallow than the SiO2 film thickness.
Journal ArticleDOI

Effect of preparation method on the performance of silver-zirconia catalysts for soot oxidation in diesel engine exhaust

TL;DR: In this paper, the effect of the preparation method on silver-zirconia (Ag/ZrO2) catalysts' physicochemical characteristics and their activity for soot oxidation in diesel engine exhaust was investigated.
Book ChapterDOI

Surface Characterization of Biomaterials

TL;DR: The surface properties of biomaterials have attracted considerable attention as selective surface properties such as cytocompatibility can be altered while desirable bulk properties, such as mechanical strength can be retained as discussed by the authors.
Journal ArticleDOI

Surface cleaning and preparation in AlGaN/GaN-based HEMT processing as assessed by X-ray photoelectron spectroscopy

TL;DR: In this paper, the chemical composition of the AlGaN/GaN surface during typical process steps in transistor fabrication was studied using X-ray photoelectron spectroscopy (XPS).