Journal ArticleDOI
Study of the resist deformation in nanoimprint lithography
Yoshihiko Hirai,Masaki Fujiwara,Takahiro Okuno,Yoshio Tanaka,M. Endo,Sigeo Irie,Kazuo Nakagawa,Masaru Sasago +7 more
TLDR
In this article, numerical simulations and experimental studies are carried out to understand the deformation process of thin polymer film in nano-imprint lithography, and the areal penetration ratio of the polymer into the recessed groove of the mold and residual thickness underneath the mold are quantitatively evaluated.Abstract:
Numerical simulations and experimental studies are carried out to understand the deformation process of thin polymer film in nanoimprint lithography. Deformation of a thin polymer above its glass transition temperature is studied for various imprinting conditions such as the aspect ratios of a mold pattern, initial thickness of the polymer, and imprinting pressure. Cross-sectional profiles of the deformed polymers are simulated by the finite element method based on a rubber elastic model. The results are compared with experimental data. The areal penetration ratio of the polymer into the recessed groove of the mold and residual thickness underneath the mold are quantitatively evaluated. The simulations and the experimental results agree well with each other.read more
Citations
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Journal ArticleDOI
Nanoimprint Lithography: Methods and Material Requirements**
TL;DR: In this paper, the basic principles of nano-printing are discussed, with an emphasis on the requirements on materials for the imprinting mold, surface properties, and resist materials for successful and reliable nanostructure replication.
Journal ArticleDOI
Recent progress in nanoimprint technology and its applications
TL;DR: Nanoimprint is an emerging lithographic technology that promises high-throughput patterning of nanostructures as mentioned in this paper, which can achieve pattern resolutions beyond the limitations set by the light diffractions or beam scatterings in other conventional techniques.
Journal ArticleDOI
Advances in top-down and bottom-up surface nanofabrication: techniques, applications & future prospects.
TL;DR: The aim is to provide a comprehensive platform for prominent nanofabrication tools and techniques in order to facilitate the development of new or hybrid nanofABrication techniques leading to novel and efficient functional nanostructured devices.
Journal ArticleDOI
Impact of polymer film thickness and cavity size on polymer flow during embossing: toward process design rules for nanoimprint lithography
TL;DR: In this paper, a continuum simulation of polymer flow during nano-imprint lithography (NIL) is presented, and three parameters can predict polymer deformation mode: cavity width to polymer thickness ratio, polymer supply ratio and capillary number.
Journal ArticleDOI
Simulation and experimental study of polymer deformation in nanoimprint lithography
TL;DR: In this paper, a polymer deformation process is studied by numerical simulations and the results are compared with the related experimental results in nano-imprint lithography, where the imprint pressures required for successful imprinting and the filling rate into the mold grooves are studied as the aspect ratio of the pattern, initial thickness of the polymer, and the duty ratio of pattern are changed.
References
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Journal ArticleDOI
A Theory of Large Elastic Deformation
TL;DR: In this paper, it was deduced that the general strain energy function, W, has the form W=G4 ∑ i=13(λi−1λi)2+H 4 ∑ t=13 (λi2−1 ε)2 + H 4, where the λi's are the principal stretches, G is the modulus of rigidity, and H is a new elastic constant not found in previous theories.
Journal ArticleDOI
Imprint of sub-25 nm vias and trenches in polymers
TL;DR: In this article, a nanoimprint process that presses a mold into a thin thermoplastic polymer film on a substrate to create vias and trenches with a minimum size of 25 nm and a depth of 100 nm has been demonstrated.
Proceedings ArticleDOI
Step and flash imprint lithography: a new approach to high-resolution patterning
Matthew E. Colburn,Stephen C. Johnson,Michael D. Stewart,S. Damle,Todd Bailey,Bernard Choi,M. Wedlake,Timothy Michaelson,Sidlgata V. Sreenivasan,John G. Ekerdt,C. Grant Willson +10 more
TL;DR: In this article, a template is created on a standard mask blank by using the patterned chromium as an etch mask to produce high-resolution relief images in the quartz.
Journal ArticleDOI
Large elastic deformations of isotropic materials vi. further results in the theory of torsion, shear and flexure
TL;DR: In this article, the forces necessary to produce simple types of deformation in a tube of incompressible, highly elastic material, isotropic in its undeformed state, are discussed.