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Journal ArticleDOI

Temperature Associated Reliability Issues of Heterogeneous Gate Dielectric—Gate All Around—Tunnel FET

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TLDR
In this article, the effect of interface trap charges such as positive interface charges and acceptor charges on the performance of heterogeneous gate dielectric-gate all around-tunnel FET (HD GAA TFET) has been investigated.
Abstract
In this paper, the temperature associated reliability issues of heterogeneous gate dielectric-gate all around-tunnel FET (HD GAA TFET) has been addressed, and the results are simultaneously compared with gate all around tunnel FET (GAA TFET). This is done by investigating the effect of interface trap charges such as donor (positive interface charges) and acceptor (negative interface charges) at various operating temperatures on the device analog parameters and RF figure of merits. It is observed that, at high gate bias, TFET exhibits weak temperature dependence owing to the weak dependence of band to band tunneling phenomenon on the temperature in comparison to the large temperature variation for lower gate bias due to the temperature dependence of Shockley-Read-Hall (SRH) phenomenon. Results reveal that extremely high off current at elevated temperatures degarades the device performance, making the device less reliable for high-temperature applications. Moreover, at elevated temperature, the decrease in threshold voltage and intrnsic delay, and increase in cut off frequency is found, thereby upgrading the device characteristics. All the simulations have been done on ATLAS device simulator.

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Journal ArticleDOI

Numerical Simulation of N + Source Pocket PIN-GAA-Tunnel FET: Impact of Interface Trap Charges and Temperature

TL;DR: In this paper, the reliability of PIN-gate-all-around (GAA)-tunnel field effect transistor (TFET) with N+ source pocket was examined by analyzing: 1) the impact of interface trap charge (ITC) density and polarity and 2) the temperature affectability on analog/RF performance.
Journal ArticleDOI

Design and Investigation of Charge-Plasma-Based Work Function Engineered Dual-Metal-Heterogeneous Gate Si-Si 0.55 Ge 0.45 GAA-Cylindrical NWTFET for Ambipolar Analysis

TL;DR: In this paper, a dopingless gate all around (GAA) nanowire tunnel field effect transistor (NWTFET) made up of dual-material channel (DMaC) was proposed.
Journal ArticleDOI

Impact of metal silicide source electrode on polarity gate induced source in junctionless TFET

TL;DR: In this article, the authors explored the performance of different SE metal silicide such as TiSi2, CrSi2 and Pd2Si in junctionless TFETs and revealed that the depletion of hole plasma (formation of Schottky interface) appears near the SE/p+ induced source interface.
Journal ArticleDOI

TCAD Temperature Analysis of Gate Stack Gate All Around (GS-GAA) FinFET for Improved RF and Wireless Performance

TL;DR: In this article, the authors investigated the impact of temperature variation on DC, analog, RF, and wireless performance of gate stack gate all around (GS-GAA) FinFET using SILVACO Atlas 3D simulator.
Journal ArticleDOI

A First Insight to the Thermal Dependence of the DC, Analog and RF Performance of an S/D Spacer Engineered DG-Ambipolar FET

TL;DR: In this paper, the temperature dependence of the digital/analog parameters and RF figure of merits (FOMs) of a spacer based reconfigurable field effect transistor (RFET) was investigated for the first time.
References
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Journal ArticleDOI

Tunnel field-effect transistors as energy-efficient electronic switches

TL;DR: Tunnels based on ultrathin semiconducting films or nanowires could achieve a 100-fold power reduction over complementary metal–oxide–semiconductor transistors, so integrating tunnel FETs with CMOS technology could improve low-power integrated circuits.
Journal ArticleDOI

Double-Gate Tunnel FET With High- $\kappa$ Gate Dielectric

TL;DR: In this article, a double-gate tunnel field effect transistor (DG tunnel FET) with a high-kappa gate dielectric was proposed and validated using realistic design parameters, showing an on-current as high as 0.23 mA for a gate voltage of 1.8 V, an off-current of less than 1 fA (neglecting gate leakage), an improved average sub-threshold swing of 57 mV/dec, and a minimum point slope of 11 mV /dec.
Journal ArticleDOI

Complementary tunneling transistor for low power application

TL;DR: In this paper, the complementary Si-based tunneling transistors are investigated in detail, and it is found that the band-to-band tunneling current is controlled by the gate-tosource voltage.
Journal ArticleDOI

Hetero-Gate-Dielectric Tunneling Field-Effect Transistors

TL;DR: In this article, the authors proposed a hetero-gate-dielectric TFET, which enhances on-current, suppresses ambipolar behavior, and makes abrupt on-off transition by replacing the source-side gate insulator with a high-k material, which induces a local minimum of the conduction band edge at the tunneling junction.
Journal ArticleDOI

The Tunnel Source (PNPN) n-MOSFET: A Novel High Performance Transistor

TL;DR: In this article, the authors proposed a novel tunnel source (PNPN) n-MOSFET based on the principle of band-to-band tunneling, which has the potential of steep subthreshold swing and improved Ion in addition to immunities against SCEs.
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