Journal ArticleDOI
Two-photon lithography of nanorods in SU-8 photoresist
TLDR
In this article, two-photon lithography in negative SU-8 photoresist was used to obtain mechanically stable, stress-free, extended nanorods having lateral sizes of about 30 nm.Abstract:
Studies on two-photon lithography in negative SU-8 photoresist demonstrate the possibility of obtaining mechanically stable, stress-free, extended nanorods having lateral sizes of about 30 nm (corresponding to λ/25 resolution). The high resolution achievable with the given combination of materials and fabrication techniques demonstrates its potential for the fabrication of large-scale nanostructures, such as photonic crystals with photonic stop gaps at visible wavelengths.read more
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Polymers for 3D Printing and Customized Additive Manufacturing
TL;DR: Polymers are by far the most utilized class of materials for AM and their design, additives, and processing parameters as they relate to enhancing build speed and improving accuracy, functionality, surface finish, stability, mechanical properties, and porosity are addressed.
Journal ArticleDOI
Vascularization is the key challenge in tissue engineering
TL;DR: Prevascularization techniques are compared to approaches in which biomolecules, such as growth factors, cytokines, peptides and proteins as well as cells are applied to generate new vessels to create vascularized tissues in vitro.
Journal ArticleDOI
Ultrafast laser processing of materials: from science to industry
Mangirdas Malinauskas,Albertas Žukauskas,Satoshi Hasegawa,Yoshio Hayasaki,Vygantas Mizeikis,Ričardas Buividas,Saulius Juodkazis,Saulius Juodkazis,Saulius Juodkazis +8 more
TL;DR: Mature opto-electrical/mechanical technologies have enabled laser processing speeds approaching meters-per-second, leading to a fast lab-to-fab transfer and emerging biomedical applications implementing micrometer feature precision over centimeter-scale scaffolds and photonic wire bonding in telecommunications are highlighted.
Journal ArticleDOI
SU-8: a photoresist for high-aspect-ratio and 3D submicron lithography
A. del Campo,Christian Greiner +1 more
TL;DR: The SU-8 photoresist has become the favourite photoreist for high-aspect-ratio (HAR) and three-dimensional (3D) lithographic patterning due to its excellent coating, planarization and processing properties as well as its mechanical and chemical stability as mentioned in this paper.
Journal ArticleDOI
Photopolymerization in 3D Printing
Ali Bagheri,Jianyong Jin +1 more
TL;DR: The field of 3D printing is continuing its rapid development in both academic and industrial research environments as mentioned in this paper, which offers flexibility over the final properties of the 3D printed materials (such as optical, chemical and mechanical properties) using versatile polymer chemistry.
References
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Journal ArticleDOI
Two-Photon Laser Scanning Fluorescence Microscopy
TL;DR: The fluorescence emission increased quadratically with the excitation intensity so that fluorescence and photo-bleaching were confined to the vicinity of the focal plane as expected for cooperative two-photon excitation.
Journal ArticleDOI
Finer features for functional microdevices
TL;DR: Micromachines can be created with higher resolution using two-photon absorption, and the results can be higher resolution than previously reported using single photon absorption techniques.
Journal ArticleDOI
Three-Dimensional Optical Storage Memory
TL;DR: A novel three-dimensional optical memory device is presented that allows fast random access of the information and extremely high bit densities and Absorption and emission data show that two-photon writing and reading of information is feasible.
Journal ArticleDOI
Direct laser writing of three-dimensional photonic-crystal templates for telecommunications
M. Deubel,Georg von Freymann,Martin Wegener,Suresh Pereira,Kurt Busch,Kurt Busch,Costas M. Soukoulis +6 more
TL;DR: The fabrication—through direct laser writing—and detailed characterization of high-quality large-scale f.c. c.