M
Max C. Lemme
Researcher at RWTH Aachen University
Publications - 344
Citations - 12984
Max C. Lemme is an academic researcher from RWTH Aachen University. The author has contributed to research in topics: Graphene & Silicon. The author has an hindex of 52, co-authored 311 publications receiving 10790 citations. Previous affiliations of Max C. Lemme include University of Siegen & Harvard University.
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A Graphene Field-Effect Device
TL;DR: In this article, a top-gated field effect device (FED) manufactured from monolayer graphene is investigated, where a conventional top-down CMOS-compatible process flow is applied.
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Recommended Methods to Study Resistive Switching Devices
Mario Lanza,H.-S. Philip Wong,Eric Pop,Daniele Ielmini,Dimitri Strukov,B. C. Regan,Luca Larcher,Marco A. Villena,Jianhua Yang,Ludovic Goux,Attilio Belmonte,Yuchao Yang,Francesco Maria Puglisi,Jinfeng Kang,Blanka Magyari-Köpe,Eilam Yalon,Anthony J. Kenyon,Mark Buckwell,Adnan Mehonic,Alexander L. Shluger,Haitong Li,Tuo-Hung Hou,Boris Hudec,Deji Akinwande,Ruijing Ge,Stefano Ambrogio,Juan Bautista Roldán,Enrique Miranda,Jordi Suñé,Kin Leong Pey,Xing Wu,Nagarajan Raghavan,Ernest Y. Wu,Wei Lu,Gabriele Navarro,Weidong Zhang,Huaqiang Wu,Run-Wei Li,Alexander W. Holleitner,Ursula Wurstbauer,Max C. Lemme,Ming Liu,Shibing Long,Qi Liu,Hangbing Lv,Andrea Padovani,Paolo Pavan,Ilia Valov,Xu Jing,Tingting Han,Kaichen Zhu,Shaochuan Chen,Fei Hui,Yuanyuan Shi +53 more
TL;DR: This manuscript describes the most recommendable methodologies for the fabrication, characterization, and simulation of RS devices, as well as the proper methods to display the data obtained.
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Efficient Inkjet Printing of Graphene
TL;DR: An efficient and mature inkjet printing technology is introduced for mass production of coffee-ring-free patterns of high-quality graphene at high resolution (unmarked scale bars are 100 μm).
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Gate-activated photoresponse in a graphene p-n junction
Max C. Lemme,Frank H. L. Koppens,Abram L. Falk,Mark S. Rudner,Hongkun Park,Leonid Levitov,Charles Marcus +6 more
TL;DR: Locally modulated photoresponse enables a new range of applications for graphene-based photodetectors including, for example, pixilated infrared imaging with control of response on subwavelength dimensions.
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Precision cutting and patterning of graphene with helium ions
TL;DR: In the present application, graphene samples on Si/SiO2 substrates are cut using helium ions, with computer controlled alignment, patterning, and exposure, providing fast lithography compatible with graphene, with approximately 15 nm feature sizes.