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Xing Wu
Researcher at East China Normal University
Publications - 202
Citations - 8774
Xing Wu is an academic researcher from East China Normal University. The author has contributed to research in topics: Resistive random-access memory & Computer science. The author has an hindex of 37, co-authored 177 publications receiving 6432 citations. Previous affiliations of Xing Wu include Fudan University & Nanyang Technological University.
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Journal ArticleDOI
Direct, Nonoxidative Conversion of Methane to Ethylene, Aromatics, and Hydrogen
Xiaoguang Guo,Fang Guangzong,Gang Li,Gang Li,Hao Ma,Hongjun Fan,Liang Yu,Chao Ma,Xing Wu,Dehui Deng,Mingming Wei,Dali Tan,Rui Si,Shuo Zhang,Jianqi Li,Litao Sun,Zichao Tang,Xiulian Pan,Xinhe Bao +18 more
TL;DR: It is reported that single iron sites embedded in a silica matrix enable direct, nonoxidative conversion of methane, exclusively to ethylene and aromatics, representing an atom-economical transformation process of methane.
Journal ArticleDOI
A single iron site confined in a graphene matrix for the catalytic oxidation of benzene at room temperature.
Dehui Deng,Xiaoqi Chen,Liang Yu,Xing Wu,Qingfei Liu,Yun Liu,Huaixin Yang,Huanfang Tian,Yongfeng Hu,Peipei Du,Rui Si,Junhu Wang,Xiaoju Cui,Haobo Li,Jianping Xiao,Tao Xu,Jiao Deng,Fan Yang,Paul N. Duchesne,Peng Zhang,Jigang Zhou,Litao Sun,Jianqi Li,Xiulian Pan,Xinhe Bao +24 more
TL;DR: Experimental measurements and density functional theory calculations indicate that the formation of the Fe═O intermediate structure is a key step to promoting the conversion of benzene to phenol, paving the way toward highly efficient nonprecious catalysts for low-temperature oxidation reactions in heterogeneous catalysis and electrocatalysis.
Journal ArticleDOI
Synthesis and Optical Properties of Large-Area Single-Crystalline 2D Semiconductor WS2 Monolayer from Chemical Vapor Deposition
Chunxiao Cong,Jingzhi Shang,Xing Wu,Bingchen Cao,Namphung Peimyoo,Caiyu Qiu,Litao Sun,Ting Yu,Ting Yu +8 more
Journal ArticleDOI
Recommended Methods to Study Resistive Switching Devices
Mario Lanza,H.-S. Philip Wong,Eric Pop,Daniele Ielmini,Dimitri Strukov,B. C. Regan,Luca Larcher,Marco A. Villena,Jianhua Yang,Ludovic Goux,Attilio Belmonte,Yuchao Yang,Francesco Maria Puglisi,Jinfeng Kang,Blanka Magyari-Köpe,Eilam Yalon,Anthony J. Kenyon,Mark Buckwell,Adnan Mehonic,Alexander L. Shluger,Haitong Li,Tuo-Hung Hou,Boris Hudec,Deji Akinwande,Ruijing Ge,Stefano Ambrogio,Juan Bautista Roldán,Enrique Miranda,Jordi Suñé,Kin Leong Pey,Xing Wu,Nagarajan Raghavan,Ernest Y. Wu,Wei Lu,Gabriele Navarro,Weidong Zhang,Huaqiang Wu,Run-Wei Li,Alexander W. Holleitner,Ursula Wurstbauer,Max C. Lemme,Ming Liu,Shibing Long,Qi Liu,Hangbing Lv,Andrea Padovani,Paolo Pavan,Ilia Valov,Xu Jing,Tingting Han,Kaichen Zhu,Shaochuan Chen,Fei Hui,Yuanyuan Shi +53 more
TL;DR: This manuscript describes the most recommendable methodologies for the fabrication, characterization, and simulation of RS devices, as well as the proper methods to display the data obtained.
Journal ArticleDOI
Layer-by-layer thinning of MoS2 by plasma.
Yulu Liu,Haiyan Nan,Xing Wu,Wei Pan,Wenhui Wang,Jing Bai,Weiwei Zhao,Litao Sun,Xinran Wang,Zhenhua Ni +9 more
TL;DR: In this article, a layer-by-layer thinning of MoS2 nanosheets down to monolayer by using Ar+ plasma is presented, and the authors demonstrate that this method can be used to prepare two-dimensional heterostructures with periodical single-layer and bilayer MOS2.