Journal ArticleDOI
SiC field-effect devices operating at high temperature
Ruby N. Ghosh,Peter Tobias +1 more
TLDR
In this paper, the reliability of n-type SiC MOS devices was investigated by monitoring the gate-leakage current as a function of temperature, and they found current densities below 17 nA/cm2 and 3 nA /cm2 at electric field strengths up to 0.6 MV/cm and temperatures of 330°C and 180°C, respectively.Abstract:
Field-effect devices based on SiC metal-oxide-semiconductor (MOS) structures are attractive for electronic and sensing applications above 250°C. The MOS device operation in chemically corrosive, high-temperature environments places stringent demands on the stability of the insulating dielectric and the constituent interfaces within the structure. The primary mode of oxide breakdown under these conditions is attributed to electron injection from the substrate. The reliability of n-type SiC MOS devices was investigated by monitoring the gate-leakage current as a function of temperature. We find current densities below 17 nA/cm2 and 3 nA/cm2 at electric field strengths up to 0.6 MV/cm and temperatures of 330°C and 180°C, respectively. These are promising results for high-temperature operation, because the optimum bias point for SiC MOS gas sensors in near midgap, where the field across the oxide is small. Our results are valid for n-type SiC MOS sensors in general and have been observed in both the 4H and 6H polytypes.read more
Citations
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Journal ArticleDOI
Advances in silicon carbide science and technology at the micro- and nanoscales
TL;DR: In this article, the authors focus on the materials science and processing technologies for silicon carbide thin films and low dimensional structures, and details recent progress in manufacturing technology, including deposition, metallization, and fabrication of semiconductor microdevices, with emphasis on sensor technology.
Journal ArticleDOI
Advances of SiC-based MOS capacitor hydrogen sensors for harsh environment applications
TL;DR: SiC-based hydrogen sensors have attracted much attention due to applications in harsh environments as discussed by the authors, and the reasons for selecting SiC in fabricating MOS capacitor hydrogen sensor for harsh environment applications are elucidated.
Journal ArticleDOI
Thermal-Responsive Polyoxometalate-Metalloviologen Hybrid: Reversible Intermolecular Three-Component Reaction and Temperature-Regulated Resistive Switching Behaviors.
You-Ren Huang,Xiang-Ling Lin,Bin Chen,Hui-Dong Zheng,Zhi-Rong Chen,Hao-Hong Li,Shou-Tian Zheng +6 more
TL;DR: In this article, an inorganic-organic hybrid crystalline polyoxometalate (POM) with usual dynamic structures is reported and used as active material for fabricating memristor with unique temperature-regulated resistive switching behaviors.
Journal ArticleDOI
Hydrogen monitoring for power plant applications using SiC sensors
TL;DR: In this article, a high-temperature gas sensing system for the detection of combustion products under harsh conditions, such as an energy plant, was developed, based on the wide band gap semiconductor silicon carbide (SiC).
Journal ArticleDOI
Silicon carbide-based hydrogen gas sensors for high-temperature applications.
TL;DR: According to the results, a thin tantalum oxide (Ta2O5) layer was exploited with the purpose of sensitivity improvement, and shows promising performance for hydrogen gas detection at high temperatures.
References
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Journal ArticleDOI
Large‐band‐gap SiC, III‐V nitride, and II‐VI ZnSe‐based semiconductor device technologies
TL;DR: In this article, the authors compare the performance of SiC, GaN, and ZnSe for high-temperature electronics and short-wavelength optical applications and conclude that SiC is the leading contender for high temperature and high power applications if ohmic contacts and interface state densities can be further improved.
Journal ArticleDOI
Effect of nitric oxide annealing on the interface trap densities near the band edges in the 4H polytype of silicon carbide
G.Y. Chung,Chin-Che Tin,J. R. Williams,K. McDonald,M. Di Ventra,Sokrates T. Pantelides,Sokrates T. Pantelides,Leonard C. Feldman,Robert A. Weller +8 more
TL;DR: In this paper, capacitance and voltage measurements for metal-oxide-semiconductor capacitors fabricated using the 4H polytype of silicon carbide doped with either nitrogen (n) or aluminum (p).
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Band offsets and electronic structure of SiC/SiO2 interfaces
TL;DR: In this paper, the electronic structure of SiC/SiO2 interfaces was studied for different SiC polytypes (3C, 4H, 6H, 15R) using internal photoemission of electrons from the semiconductor into the oxide.
Journal ArticleDOI
Improved oxidation procedures for reduced SiO 2 /SiC defects
L.A. Lipkin,John W. Palmour +1 more
TL;DR: In this article, a significant reduction in the effective oxide charge and interface state densities in oxides grown on p-type 6H-SiC has been obtained by lowering the oxidation temperature of SiC to 1050°C.
Journal ArticleDOI
Time-dependent-dielectric-breakdown measurements of thermal oxides on n-type 6H-SiC
M.M. Mathur,J.A. Cooper +1 more
TL;DR: In this article, time-dependent dielectric breakdown (TDDB) measurements are reported on n-type 6H-SiC MOS capacitors formed by thermal oxidation.