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Journal ArticleDOI

Ultraviolet detectors in thin sputtered ZnO films.

Henrik Fabricius, +2 more
- 15 Aug 1986 - 
- Vol. 25, Iss: 16, pp 2764-2767
TLDR
Ultraviolet-sensitive photodiodes have been made using the Schottky barrier formed in the contact layer between a thin sputtered layer of ZnO and Au by optimizing the sputtering parameters and the IV characteristics and the sensitivity spectra were investigated.
Abstract
Ultraviolet-sensitive photodiodes have been made using the Schottky barrier formed in the contact layer between a thin sputtered layer of ZnO and Au. The sputtering parameters for the ZnO layer were optimized. The IV characteristics and the sensitivity spectra of the ZnO–Au photodiodes were investigated.

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Citations
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Journal ArticleDOI

Semiconductor ultraviolet detectors

TL;DR: In this paper, a comprehensive analysis of the developments in ultraviolet (UV) detector technology is described and the current state of the art of different types of semiconductor UV detectors is presented.
Journal ArticleDOI

Wide-bandgap semiconductor ultraviolet photodetectors

TL;DR: In this paper, a general review of the advances in widebandgap semiconductor photodetectors is presented, including SiC, diamond, III-nitrides and ZnS.
Journal ArticleDOI

ZnO Schottky ultraviolet photodetectors

TL;DR: In this paper, the results of Schottky UV photodetectors fabricated on n-type ZnO epitaxial films were presented, which were grown on R-plane sapphire substrates by metalorganic chemical vapor deposition.
Journal ArticleDOI

ZnO-Based Ultraviolet Photodetectors

TL;DR: The performance of ZnO-based photodetectors is analyzed, discussing recent achievements, and comparing the characteristics of the variousPhotodetector structures developed to date.
Journal ArticleDOI

Optical properties of sputter-deposited ZnO:Al thin films

TL;DR: In this article, an effective mass model for n-doped semiconductors is proposed for n−doped polysilicon, where the Al atoms act as pointlike Coulomb scatterers and are screened by the electrons acco...
References
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Journal ArticleDOI

Measurements of adherence of residually stressed thin films by indentation. II. Experiments with ZnO/Si

TL;DR: In this article, a change in crack path from the interface to the film, accompanied by an increase in crack radius, is observed and interpreted as a buckling-induced stress intensification.
Journal ArticleDOI

Surface barriers on ZnSe and ZnO

Carver A. Mead
- 01 Sep 1965 - 
TL;DR: In this article, surface barrier measurements of several metals on vacuum cleaved ZnSe and ZnO surfaces are reported, indicating that both of these materials behave as expected for materials without surface states.
Journal ArticleDOI

Zinc-oxide thin-film surface-wave transducers

TL;DR: In this paper, the authors summarized a body of knowledge which has been developed on the characteristics of transducer quality ZnO film layers, and focused attention on those sputtering parameters and microstructural properties which characterize a superior surface-wave transducers.
Journal ArticleDOI

Self-Compensation-Limited Conductivity in Binary Semiconductors. III. Expected Correlations With Fundamental Parameters

TL;DR: In this article, the degree of self-compensation in a binary semiconductor is used to obtain a useful correlation between the degree by singly ionized natural defects and the ratio of the electronic energy gap to certain generally known thermodynamic quantities.
Journal ArticleDOI

Studies of the optimum conditions for growth of rf‐sputtered ZnO films

TL;DR: In this paper, a technique for deposition of highly oriented rf−sputtered zinc oxide films on (111) gold, ( 111) silicon, (0001) sapphire, and fused quartz is described.
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