Showing papers on "Sputter deposition published in 2018"
TL;DR: In this paper, a review of the improvements already studied in order to optimize the sputtering PVD process, trying to relate these improvements with the industrial requirements as a function of product development and market demand is presented.
Abstract: Physical vapour deposition (PVD) is a well-known technology that is widely used for the deposition of thin films regarding many demands, namely tribological behaviour improvement, optical enhancement, visual/esthetic upgrading, and many other fields, with a wide range of applications already being perfectly established. Machining tools are, probably, one of the most common applications of this deposition technique, sometimes used together with chemical vapour deposition (CVD) in order to increase their lifespan, decreasing friction, and improving thermal properties. However, the CVD process is carried out at higher temperatures, inducing higher stresses in the coatings and substrate, being used essentially only when the required coating needs to be deposited using this process. In order to improve this technique, several studies have been carried out optimizing the PVD technique by increasing plasma ionization, decreasing dark areas (zones where there is no deposition into the reactor), improving targets use, enhancing atomic bombardment efficiency, or even increasing the deposition rate and optimizing the selection of gases. These studies reveal a huge potential in changing parameters to improve thin film quality, increasing as well the adhesion to the substrate. However, the process of improving energy efficiency regarding the industrial context has not been studied as deeply as required. This study aims to proceed to a review regarding the improvements already studied in order to optimize the sputtering PVD process, trying to relate these improvements with the industrial requirements as a function of product development and market demand.
217 citations
TL;DR: In this paper, a conformal nano-meter thickness amorphous Al2O3 thin film via magnetron sputtering technique on its surface was constructed to stabilize lithium metal by engineering an artificial SEI layer.
155 citations
TL;DR: In this paper, a thermochromic Cr2O3/VO2/SiO2 (CVS) sandwich structure on glass substrates was designed and fabricated by magnetron sputtering method.
133 citations
TL;DR: In this paper, the MoS2, CuO and n-MoS2/p-CuO heterojunction nanoworms thin films were fabricated on ITO coated glass substrate by DC magnetron sputtering method.
Abstract: In this work, the MoS2, CuO and n-MoS2/p-CuO heterojunction nanoworms thin films were fabricated on ITO coated glass substrate by DC magnetron sputtering method. The ammonia (NH3) gas sensing properties of MoS2/CuO nanoworms bilayer sensor towards low detection range (5–500 ppm) have been discussed in detail. The as prepared nanoworms based gas sensor reveals the fast response/recovery time (17 s/26 s), high sensing response (S.R∼47%) with remarkable reproducibility (15 cycles) during exposure to 100 ppm ammonia in the dry synthetic air at room temperature. Furthermore, the working principle documented to the outstanding performance of the proposed sensor towards ammonia gas was also studied in details.
98 citations
TL;DR: In this article, the interfacial thermal conductance (G) between diamond and Cu was experimentally measured by a time-domain thermoreflectance (TDTR) technique to investigate the dependence of the G on the Cu/interlayer/diamond structure.
98 citations
TL;DR: In this article, an easy method of preparing well-crystallized Sb 2 Se 3 films and nanorods through magnetron sputtering was proposed, and their growth mechanism was examined.
96 citations
TL;DR: A critical review of the evolution of the advanced coatings deposition process, mainly focused on the Physical Vapour Deposition (PVD) process, particularly in the Magnetron Sputtering technique, is presented in this paper.
88 citations
TL;DR: In this article, multicomponent carbide thin films of (CrNbTaTiW)C (30-40% C) with different metal contents were deposited at different temperatures using non-reactive DC magnetron sputtering.
88 citations
TL;DR: In this paper, the authors used photoluminescence (PL) emission spectroscopy and time-resolved photoline (TRPL) to detect an increase in minority carrier lifetime for thin polycrystalline absorber films with interface passivation.
Abstract: Commercial CdTe PV modules have polycrystalline thin films deposited on glass, and devices made in this format have exceeded 22% efficiency. Devices made by the authors with a magnesium zinc oxide window layer and tellurium back contact have achieved efficiency over 18%, but these cells still suffer from an open-circuit voltage far below ideal values. Oxide passivation layers made by sputter deposition have the potential to increase voltage by reducing interface recombination. CdTe devices with these passivation layers were studied with photoluminescence (PL) emission spectroscopy and time-resolved photoluminescence (TRPL) to detect an increase in minority carrier lifetime. Because these oxide materials exhibit barriers to carrier collection, micropatterning was used to expose small point contacts while still allowing interface passivation. TRPL decay lifetimes have been greatly enhanced for thin polycrystalline absorber films with interface passivation. Device performance was measured and current collection was mapped spatially by light-beam-induced current.
81 citations
TL;DR: In this paper, the authors present an overview of the hysteresis in a reactive magnetron sputtering process and the possibilities to eliminate them in a stable operative sense using phenomenological global models.
Abstract: Reactive magnetron sputtering is a well-established physical vapor technique to deposit thin compound films on different substrates, ranging from insulating glass windows over wear-resistant car parts to high-responsive touch screens. In this way, the industrial and technological relevance drives the need to understand this process on a more profound level to make optimal use of it. Notwithstanding, the basic principles of the technique can be summarized on a single sheet of paper, and truly mastering and understanding the process behavior is not a simple task. One of the main reasons is the often strong non-linear response of the reactive system to changes in the operation parameters or to small system fluctuations. This aspect of reactive sputtering is embodied by the occurrence of a hysteresis in the system observables as a function of the operation parameters. It is the existence of the hysteresis that troubles optimal deposition and process control on the one hand and gives voice to the intertwined physical and chemical complexity on the other hand. The aim of this tutorial can be considered as threefold: to acquaint the reader with an insight into the concept of the hysteresis during reactive sputtering, to touch some of the possibilities to eliminate the hysteresis, and finally, to present how to control this hysteresis in a stable operative sense. To this end, the reactive magnetron sputtering process will be formulated in practical parameters and by two discriminating phenomenological global models: the original Berg model and the reactive sputtering deposition (RSD) model. The reactive sputtering of Al in an O 2/Ar atmosphere under direct discharge current control will be used as a reference system. The models are able to describe the hysteresis effects, giving an insight into their origin and the possibilities to eliminate them. The discharge description can, in this context, be reduced to the current/voltage or I V-characteristic and its response to a changing target state. The tutorial concludes with the existence of a double hysteresis effect and an explanation based on the RSD model.
80 citations
TL;DR: In this paper, an in-situ doped polycrystalline silicon film is formed, upon annealing, onto an ultrathin SiOx interlayer, thus providing selective conduction and surface passivation simultaneously.
Abstract: Of all the materials available to create carrier-selective passivating contacts for silicon solar cells, those based on thin films of doped silicon have permitted to achieve the highest levels of performance. The commonly used chemical vapour deposition methods use pyrophoric or toxic gases like silane, phosphine and diborane. In this letter, we propose a safer and simpler approach based on physical vapour deposition (PVD) of both the silicon and the dopant. An in-situ doped polycrystalline silicon film is formed, upon annealing, onto an ultrathin SiOx interlayer, thus providing selective conduction and surface passivation simultaneously. These properties are demonstrated here for the case of hole-selective passivating contacts, which present recombination current densities lower than 20 fA/cm2 and contact resistivities below 50 mΩ cm2. To further demonstrate the PVD approach, these contacts have been implemented in complete p-type silicon solar cells, together with a front phosphorus diffusion, achieving an open-circuit voltage of 701 mV and a conversion efficiency of 23.0%. These results show that PVD by sputtering is an attractive and reliable technology for fabricating high performance silicon solar cells.
TL;DR: In this article, the antimicrobial activity of narrow band gap semiconductor photocatalysts under visible light irradiation was compared to titanium dioxide, which is the conventionally used photocatalyst material.
Abstract: The aim of the present paper is to assess the antimicrobial activity of novel narrow band gap semiconductor photocatalysts under visible light irradiation, compared to titanium dioxide, which is the conventionally used photocatalytic material. Bismuth oxide, bismuth tungstate and titanium dioxide coatings were prepared using pulsed DC reactive magnetron sputter deposition onto batches of 2 mm spherical glass beads that were agitated during the deposition process to ensure uniform coverage. Additional coatings were deposited onto flat glass substrates for specific analytical techniques. Following deposition, the coatings were annealed in air at 673 K for 30 min to enable crystal structure development. Annealed coatings were analysed with SEM, EDX, XRD, XPS, AFM, UV–vis spectroscopy and water contact angle measurements. The photocatalytic properties of the coatings were initially assessed via a Rhodamine B dye degradation test under visible light irradiation. Antimicrobial efficiency of the coatings was tested via inactivation of E. coli; additionally, bacterial adhesion experiments were performed for all types of the studied coatings. It was found that the performance of bismuth oxide for both dye degradation and bacterial inactivation experiments under visible light was superior to that observed for either bismuth tungstate or titanium dioxide. Moreover, bismuth oxide coatings (and to a lesser extent – bismuth tungstate), due to its hydrophobic nature was able to inhibit bacterial adhesion to the surface.
TL;DR: In this article, the effect of different annealing conditions of ZnO thin films grown by RF magnetron sputtering and their application as photocatalysts for hydrogen production without any sacrificial agent or co-catalyst was studied.
TL;DR: In this article, the effects of oxygen partial pressures on the thin films were analyzed through Scanning Electron Microscopy (SEM), Atomic Force MicroScopy (AFM), X-ray Diffraction (XRD), Xray Photoelectron Spectroscopy (XPS) and Hall measurements.
TL;DR: In this article, a simulated and an experimental design of multilayer solar selective absorber coatings for high temperature applications is presented, where the optical tandem is composed of four layers deposited by magnetron sputtering on stainless steel substrates at room temperature.
TL;DR: The combination of lithium trapping and apparent morphological densification evolution in NiO is believed to account for the degradation of the ECD properties upon long term cycling of the WO/WO/ITO/ NiO ECD.
Abstract: The visualization of the microstructure change and of the depth of lithium transport inside a monolithic ElectroChromic Device (ECD) is realized using an innovative combined approach of Focused Ion Beam (FIB), Secondary Ion Mass Spectrometry (SIMS) and Glow Discharge Optical Emission Spectroscopy (GDOES). The electrochemical and optical properties of the all-thin-film inorganic ECD glass/ITO/WO3/LiTaO3/NiO/ITO, deposited by magnetron sputtering, are measured by cycling voltammetry and in situ transmittance analysis up to 11 270 cycles. A significant degradation corresponding to a decrease in the capacity of 71% after 2500 cycles and of 94% after 11 270 cycles is reported. The depth resolved microstructure evolution within the device, investigated by cross-sectional cutting with FIB, points out a progressive densification of the NiO layer upon cycling. The existence of irreversible Li ion trapping in NiO is illustrated through the comparison of the compositional distribution of the device after various cycles 0, 100, 1000, 5000 and 11 270. SIMS and GDOES depth profiles confirm an increase in the trapped Li content in NiO as the number of cycles increases. Therefore, the combination of lithium trapping and apparent morphological densification evolution in NiO is believed to account for the degradation of the ECD properties upon long term cycling of the ECD.
TL;DR: Overall, this article focuses on the preparation of optimized Si-based thin film electrodes in combination with LIPON solid electrolyte coatings for use in high-energy lithium ion batteries.
Abstract: In this work, we present a comprehensive study on the influence of lithium phosphorus oxynitride (LIPON) as a possible “artificial SEI layer” on the electrochemical performance of pure silicon (Si) thin film electrodes for a possible application in microbatteries or on-chip batteries. Si thin film anodes (140 nm) with and without an additional amorphous LIPON surface layer of different thicknesses (100–300 nm) were prepared by magnetron sputter deposition. The LIPON surface coating was characterized thoroughly by means of electrochemical impedance spectroscopy, Raman spectroscopy, X-ray photoelectron spectroscopy and atomic force microscopy. In situ electrochemical dilatometry and ex situ cross-section analysis of the electrodes after cycling could prove that the LIPON coating greatly diminishes the volume expansion of the Si electrode and, therefore, significantly improves the cycling stability and capacity retention. Furthermore, the LIPON coating remarkably reduces parasitic electrolyte decomposition reactions that originate from the Si volume expansion and contribute to the overall electrode volume expansion, as observed by the enhanced Coulombic efficiency over ongoing charge/discharge cycling. Overall, this article focuses on the preparation of optimized Si-based thin film electrodes in combination with LIPON solid electrolyte coatings for use in high-energy lithium ion batteries.
TL;DR: In this paper, super anti-corrosive copper/diamond-like carbon (Cu/DLC) composite films are applied on mild steel utilizing magnetron sputtering in a mixed atmosphere of Ar and CH4.
Abstract: Super anti-corrosive copper/diamond-like carbon (Cu/DLC) composite films are applied on mild steel utilizing magnetron sputtering in a mixed atmosphere of Ar and CH4. Mechanical, contact angle, and corrosion performance of the resulting Cu/DLC thin films are probed and discussed in terms of Ar/CH4 and Cu/C ratios. Overall, Cu/C ratio has augmented by Ar/CH4 ratio. Raman spectra of films revealed typical features of G and D bands indicating formation of DLC phase. The Cu/DLC thin films with higher Cu content exhibited a higher degree of sp2 carbon clustering, but lower diamond-like sp3 bonding. Internal stress values of Cu/DLC thin films decreased with increasing Cu/C ratio. Addition of a few amount of Cu to DLC resulted in a rise in plastic hardness and H3/E2 ratio of Cu/DLC composite thin films, but optimum value was observed for composite films having an intermediate Cu concentration. The contact angle of iron substrate increased when coated with Cu/DLC thin films, but Cu content of films played a minor role. The Cu/DLC thin films formed via magnetron sputtering revealed super anti-corrosion performance, the term which is defined, conceptualized, and quantified in the current study.
TL;DR: In this paper, multicomponent nitride coatings of the Hf-Nb-Ti-V-Zr system with different Hf content (0-18 at.%) were deposited using reactive dc magnetron sputtering.
Abstract: Multicomponent nitride coatings of the Hf-Nb-Ti-V-Zr system with different Hf content (0-18 at.%) were deposited using reactive dc magnetron sputtering. Coatings with lower Hf content (0-7 at.%) we ...
TL;DR: In this article, the x-ray photoelectron spectroscopy (XPS) core level binding energies (BEs) for the widely-applicable groups IVb-VIb transition metal carbides (TMCs) were reported.
TL;DR: In this study, (Al0.5CrFeNiTi0.25)Nx high-entropy films are prepared by a reactive direct current magnetron sputtering at different N2 flow rates on silicon wafers and an FCC (Al-Cr-Fe-Ni-Ti)N solid solution forms.
Abstract: In this study, (Al0.5CrFeNiTi0.25)Nx high-entropy films are prepared by a reactive direct current (DC) magnetron sputtering at different N2 flow rates on silicon wafers. It is found that the structure of (Al0.5CrFeNiTi0.25)Nx high-entropy films is amorphous, with x = 0. It transforms from amorphous to a face-centered-cubic (FCC) structure with the increase of nitrogen content, while the bulk Al0.5CrFeNiTi0.25 counterpart prepared by casting features a body-centered-cubic (BCC) phase structure. The phase formation can be explained by the atomic size difference (δ). Lacking nitrogen, δ is approximately 6.4% for the five metal elements, which is relatively large and might form a BCC or ordered-BCC structure, while the metallic elements in this alloy system all have a trend to form nitrides like TiN, CrN, AlN, and FeN. Therefore, nitride components are becoming very similar in size and structure and solve each other easily, thus, an FCC (Al-Cr-Fe-Ni-Ti)N solid solution forms. The calculated value of δ is approximately 23% for this multicomponent nitride solid solution. The (Al0.5CrFeNiTi0.25)Nx films achieve a pronounced hardness and a Young's modulus of 21.45 GPa and 253.8 GPa, respectively, which is obviously much higher than that of the as-cast Al0.5CrFeNiTi0.25 bulk alloys.
TL;DR: In this paper, a vertically standing PtSe2 film on transparent quartz was prepared by selenization of platinum film deposited by the magnetron sputtering method, and an Nd:LuVO4 passively mode-locked solid-state laser was realized by using the fabricated PtSe 2 film as a saturable absorber.
Abstract: The novel vertically standing PtSe2 film on transparent quartz was prepared by selenization of platinum film deposited by the magnetron sputtering method, and an Nd:LuVO4 passively mode-locked solid-state laser was realized by using the fabricated PtSe2 film as a saturable absorber. The X-ray diffraction pattern and Raman spectrum of the film indicate its good crystallinity with a layered structure. The thickness of PtSe2 film is measured to be 24 nm according to the cross-section height profile of the atomic force microscope image. High-resolution transmission electron microscopy images clearly demonstrate its vertically standing structure with an interlayer distance of 0.54 nm along the c-axis direction. The modulation depth (ΔT) and saturation fluence (ϕs) of PtSe2 film are measured to be 12.6% and 17.1 μJ/cm2, respectively. The obtained mode-locked laser spectrum has a central wavelength of 1066.573 nm, with a 3 dB bandwidth of 0.106 nm. The transform limited pulse width of the mode-locked laser was calculated to be 15.8 ps. A maximum average output power of 180 mW with a working repetition rate of 61.3 MHz is obtained. To the best of our knowledge, this is the first report of the generation of ultrafast mode-locked laser pulses by using layered PtSe2 as a saturable absorber.
TL;DR: In this article, the effect of annealing temperature on the surface chemical state of nano-crystalline TiO2 thin films was analyzed using X-Ray Photoelectron Spectroscopy (XPS).
TL;DR: The vertically aligned nanowall array architecture of the cathodes can significantly mitigate disordered LMO formation at the cathode surface compared to the 2D planar thin film, resulting in a greatly reduced interface resistance and improved rate performance.
Abstract: 3D all-solid-state thin film batteries (TFBs) are proposed as an attractive power solution for microelectronics. However, the challenge in fabricating self-supported 3D cathodes constrains the progress in developing 3D TFBs. In this work, 3D LiMn2 O4 (LMO) nanowall arrays are directly deposited on conductive substrates by magnetron sputtering via controlling the thin film growth mode. 3D TFBs based on the 3D LMO nanowall arrays and 2D TFBs based on the planar LMO thin films are successfully fabricated using a lithium phosphorous oxynitride (LiPON) electrolyte and Li anode. In comparison, the 3D TFB significantly outperforms the 2D TFB, exhibiting large specific capacity (121 mAh g-1 at 1 C), superior rate capability (83 mAh g-1 at 20 C), and good cycle performance (over 90% capacity retention after 500 cycles). The superior electrochemical performance of the 3D TFB can be attributed to the 3D architecture, which not only greatly increases the cathode/electrolyte interface and shortens the Li+ diffusion length, but also effectively enhances the structural stability. Importantly, the vertically aligned nanowall array architecture of the cathode can significantly mitigate disordered LMO formation at the cathode surface compared to the 2D planar thin film, resulting in a greatly reduced interface resistance and improved rate performance.
TL;DR: In this article, tunnel magnetoresistance in MgO-based magnetic tunnel junctions (MTJs) with equiatomic quaternary CoFeMnSi Heusler and CoFe alloy electrodes is studied.
Abstract: Tunnel magnetoresistance (TMR) in MgO-based magnetic tunnel junctions (MTJs) with equiatomic quaternary CoFeMnSi Heusler and CoFe alloy electrodes is studied. The epitaxial MTJ stacking structures were prepared using ultrahigh-vacuum magnetron sputtering, where the CoFeMnSi electrode has a full B2 and partial L21 ordering crystal structure. Maximum TMR ratios of 101% and 521% were observed at room temperature and 10 K, respectively, for the MTJs. The large bias voltage dependence of the TMR ratio was also observed at low temperature (LT), as similarly observed in Co2MnSi Heusler alloy-based MTJs in the past. The physical origins of this relatively large TMR ratio at LT were discussed in terms of the half-metallicity of CoFeMnSi.
TL;DR: In this paper, the authors showed that by performing the heat treatment in vacuum under a pressure of 10−2 mbar (low-vacuum heat-treatment), the electrical resistivity of the AZO target reached the lowest value compared to the other heat treatment conditions.
TL;DR: In this paper, TixNy thin films are applied on biological TC4 substrates in a mixed atmosphere of Ar and N2 via magnetron sputtering system for the protection of TC4 alloy.
Abstract: Progress in tissue engineering and regenerative medicine necessitates the use of novel materials with promising bio-surface for biomedical applications. In this work, TixNy thin films are applied on biological TC4 substrates in a mixed atmosphere of Ar and N2 via magnetron sputtering system for the protection of TC4 alloy. The effects of N/Ti ratio on the phase structure, growth orientation, contact angle, and the mechanical and corrosion performances of thin films are discussed by implementation of composition-microstructure-property interrelationships. The phase structure of TixNy thin films is changed from amorphous-like to single phase Ti2N structure with increasing N/Ti ratio. In the same direction, the growth orientation changed from (112) to (200). The contact angle of TC4 alloy increased by applying TixNy thin films on the substrate. TixNy thin films prepared at higher N/Ti ratios resulted in higher contact angle, mechanical properties, corrosion resistance and biocompatibility. The hardness value of the films varied between 7.5 to 28 GPa, while the Young’s modulus, EIT, of the films ranged from 152 to 476 GPa. The maximum protection efficiency in SBF solution was found to be about 99.4%. Based on equivalent circuit model of MG63 cell, the TiN-4 exhibited the nearest similarity with best biocompatibility. The results of this work uncovered the critical roles of nitrogen content and growth orientation on the mechanical and biological properties of TixNy thin films. The upshots illuminate the appropriate properties of such system, which can be potentially used in different application such as metal orthopedic and neural electrodes. Development of such surface-coated titanium alloy showing superior corrosion resistance and biocompatibility can pave the way towards advanced bio-coatings with multifaceted features.
TL;DR: In this article, the effects of film thickness on the electrical, optical, morphological, and structural properties of CRMS-grown ITO films are investigated in detail to correlate the thickness and performance of ITO.
TL;DR: In this paper, the authors investigated Al-doped VO 2 films as thermochromic coatings on glass substrates by DC magnetron sputtering and found that adding Al 3+ ions into VO 2 can generate groups of polygonal grains and nanowire clusters, apart from routinely reducing the valence and decreasing the grain size.
TL;DR: In this article, the authors describe the systematics of IBSD, the correlation between process parameters, properties of the film-forming particles, and thin film properties, as well as fundamental physical aspects, experimental setups, and techniques for thin film deposition and particle characterization.
Abstract: There is an increasing demand for thin films with tailored properties, which requires the use and control of adequate deposition techniques. Ion beam sputter deposition (IBSD) is a physical vapor deposition (PVD) technique that is capable of fulfilling the technological challenges. In contrast to other PVD techniques, IBSD offers a unique opportunity to tailor the properties of the film-forming particles (sputtered target and scattered primary particles) and, hence, thin film properties. This is related to the fact that the generation and acceleration of the primary particles from the ion beam source, the generation of film-forming particles at the target, and thin film growth on the substrate are spatially separated. Thus, by changing ion beam parameters (ion species and ion energy) and geometrical parameters (ion incidence angle and emission angle), the energy distributions of the film-forming particles are modified. Even though in use for several decades, IBSD was not investigated systematically until lately. Utilizing the full potential of IBSD requires a comprehensive understanding of the physical processes. This tutorial describes the systematics of IBSD: The correlation between process parameters, properties of the film-forming particles, and thin film properties. The most important process parameters are the scattering geometry and the primary particle species. Depending on the material, different film properties can be influenced. Examples are adhesion, structural properties, composition, surface roughness, mass density, optical properties, stress, and electrical resistivity. In addition to the experimental results, fundamental physical aspects, experimental setups, and techniques for thin film deposition and particle characterization are described.