scispace - formally typeset
J

James Hone

Researcher at Columbia University

Publications -  702
Citations -  128248

James Hone is an academic researcher from Columbia University. The author has contributed to research in topics: Graphene & Monolayer. The author has an hindex of 127, co-authored 637 publications receiving 108193 citations. Previous affiliations of James Hone include DARPA & Santa Fe Institute.

Papers
More filters
Journal ArticleDOI

EGFR and HER2 activate rigidity sensing only on rigid matrices.

TL;DR: It is shown that in serum- and EGF-free conditions, EGFR or HER2 activity increase spreading and rigidity-sensing contractions on rigid, but not soft, substrates, and that EGFR and HER2 are activated through phosphorylation by Src family kinases (SFK).
Journal ArticleDOI

Direct measurement of discrete valley and orbital quantum numbers in bilayer graphene

TL;DR: Hunt et al. as mentioned in this paper measured the layer-resolved charge density, from which they directly determined the valley and orbital polarization within the zero energy Landau level, and fit their data to a model that captures both singleparticle and interaction-induced anisotropies, providing a complete picture of this correlated electron system.
Journal ArticleDOI

Enhanced Photodetection in Graphene-Integrated Photonic Crystal Cavity

TL;DR: In this paper, the authors demonstrate the controlled enhancement of photoresponsivity in a graphene photodetector by coupling to slow light modes in a long photonic crystal linear defect cavity.
Journal ArticleDOI

Enhanced photodetection in graphene-integrated photonic crystal cavity

TL;DR: In this article, the authors demonstrate the controlled enhancement of photoresponsivity in a graphene photodetector by coupling to slow light modes in a long photonic crystal linear defect cavity.
Journal ArticleDOI

Simple Fabrication of Molecular Circuits by Shadow Mask Evaporation

TL;DR: In this paper, a stencil mask was used to fabricate contacts to molecular circuits by evaporating metal through a nanoscale mask etched in a free-standing silicon nitride membrane.