scispace - formally typeset
Journal ArticleDOI

Analysis on switching mechanism of graphene oxide resistive memory device

Seul Ki Hong, +3 more
- 22 Aug 2011 - 
- Vol. 110, Iss: 4, pp 044506
TLDR
In this paper, the switching mechanism of the graphene oxide memory was investigated through a comprehensive study on the switching phenomena. And the switching operation of GORAM was found to be governed by dual mechanism of oxygen migration and Al diffusion.
Abstract
Recently, a flexible resistive switching memory device using graphene oxide was successfully demonstrated. In this work, the new findings on the switching mechanism of the graphene oxide memory are presented through a comprehensive study on the switching phenomena. It has been found that the switching operation of graphene oxide resistive switching memory (RRAM) is governed by dual mechanism of oxygen migration and Al diffusion. However, the Al diffusion into the graphene oxide is the main factor to determine the switching endurance property which limits the long term lifetime of the device. The electrode dependence on graphene oxide RRAM operation has been analyzed as well and is attributed to the difference in surface roughness of graphene oxide for the different bottom electrodes.

read more

Content maybe subject to copyright    Report

Citations
More filters
Journal ArticleDOI

Non-volatile resistive memory devices based on solution-processed ultrathin two-dimensional nanomaterials

TL;DR: This tutorial review will summarize the recent progress in the utilization of solution-processed ultrathin 2D nanomaterials for fabrication of non-volatile resistive memory devices, and demonstrate how to achieve excellent device performance by engineering the active layers, electrodes and/or device structure of resistiveMemory devices.
Journal ArticleDOI

Graphene and Related Materials for Resistive Random Access Memories

TL;DR: Graphene and related materials (GRMs) are promising candidates for the fabrication of resistive random access memories (RRAMs) as mentioned in this paper, and the performance of a number of RRAM prototypes using GRMs is summarized Graphene oxide, amorphous carbon films, transition metal dichalcogenides, hexagonal boron nitride and black phosphorous can be used as resistive switching media.
Journal ArticleDOI

Nanoionics-Enabled Memristive Devices: Strategies and Materials for Neuromorphic Applications

TL;DR: A critical overview of the proposed nano-ionic mechanisms for memristive switching is given in this paper, focusing particularly on providing fundamental insights into the strategies for regulating the adaptive memrisive characteristics of devices that resemble the behaviors of biological synapses, which is an element of neural networks.
Journal ArticleDOI

Fluorinated graphene as high performance dielectric materials and the applications for graphene nanoelectronics.

TL;DR: It is found that fluorographene with extremely thin thickness (5 nm) can sustain high resistance at temperature up to 400°C and show excellent dielectric properties with fast and scalable processing, providing a universal applications for the integration of versatile nano-electronic devices.
References
More filters
Journal ArticleDOI

Nanoionics-based resistive switching memories

TL;DR: A coarse-grained classification into primarily thermal, electrical or ion-migration-induced switching mechanisms into metal-insulator-metal systems, and a brief look into molecular switching systems is taken.
Journal ArticleDOI

Atomic structure of conducting nanofilaments in TiO2 resistive switching memory

TL;DR: In situ current-voltage and low-temperature conductivity measurements confirm that switching occurs by the formation and disruption of Ti(n)O(2n-1) (or so-called Magnéli phase) filaments, which will provide a foundation for unravelling the full mechanism of resistance switching in oxide thin films.
Journal ArticleDOI

Graphene oxide thin films for flexible nonvolatile memory applications.

TL;DR: The microscopic origin of the bipolar resistive switching behavior was elucidated and is attributed to rupture and formation of conducting filaments at the top amorphous interface layer formed between the graphene oxide film and the top Al metal electrode, via high-resolution transmission electron microscopy and in situ X-ray photoemission spectroscopy.
Related Papers (5)