Atomic structure of conducting nanofilaments in TiO2 resistive switching memory

TLDR: In situ current-voltage and low-temperature conductivity measurements confirm that switching occurs by the formation and disruption of Ti(n)O(2n-1) (or so-called Magnéli phase) filaments, which will provide a foundation for unravelling the full mechanism of resistance switching in oxide thin films.

Abstract: Resistance switching in metal oxides could form the basis for next-generation non-volatile memory. It has been argued that the current in the high-conductivity state of several technologically relevant oxide materials flows through localized filaments, but these filaments have been characterized only indirectly, limiting our understanding of the switching mechanism. Here, we use high-resolution transmission electron microscopy to probe directly the nanofilaments in a Pt/TiO2/Pt system during resistive switching. In situ current–voltage and low-temperature (∼130 K) conductivity measurements confirm that switching occurs by the formation and disruption of TinO2n−1 (or so-called Magneli phase) filaments. Knowledge of the composition, structure and dimensions of these filaments will provide a foundation for unravelling the full mechanism of resistance switching in oxide thin films, and help guide research into the stability and scalability of such films for applications. Nanoscale filaments with a Magneli structure are shown to be responsible for resistance switching in thin films of TiO2, and the properties of the filaments are directly observed during the switching process.