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Characterization and optimization of zinc oxide films by r.f. magnetron sputtering

Kalpathy B. Sundaram, +1 more
- 28 Feb 1997 - 
- Vol. 295, pp 87-91
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TLDR
In this article, zinc oxide films were deposited by a rf magnetron sputtering using a zinc oxide target and characterized as a function of deposition temperature, pressure, argon-oxygen gas flow ratio, target-substrate distance.
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This article is published in Thin Solid Films.The article was published on 1997-02-28. It has received 227 citations till now. The article focuses on the topics: Sputter deposition & Zinc.

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Citations
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Patent

Semiconductor device including active layer made of zinc oxide with controlled orientations and manufacturing method thereof

TL;DR: A semiconductor device includes an oxide semiconductor thin film layer primarily including zinc oxide having at least one orientation other than (002) orientation as discussed by the authors, and the zinc oxide may have a mixed orientation including (100) and (101) orientation.
Journal ArticleDOI

Zinc oxide films prepared by sol-gel spin-coating

TL;DR: In this article, electrical conductivity and optical properties of undoped zinc oxide films prepared by the sol-gel process using a spin-coating technique were investigated, and it was shown that the optical band gap energy for the films was 3.20-3.21 eV and the electronic transition was of the direct transition type.
Journal ArticleDOI

Recent developments on ZnO films for acoustic wave based bio-sensing and microfluidic applications: a review

TL;DR: In this paper, a review of recent developments on the preparation and application of ZnO films for acoustic wave-based microfluidics and biosensors is presented, and the potential to fabricate an integrated lab-on-a-chip diagnostic system based on these ZnOs acoustic wave technologies is discussed.
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The effect of heat treatment on the physical properties of sol-gel derived ZnO thin films

TL;DR: In this paper, the effect of thermal annealing in air on the physical properties of the sol-gel derived ZnO thin films were studied, and the powder and its thin film were characterized by X-ray diffractometer (XRD) method.
References
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Journal ArticleDOI

Optical and electrical properties of ZnO films prepared by spray pyrolysis for solar cell applications

TL;DR: In this paper, spray pyrolysis was used to produce transparent zinc oxide films with resistivity as low as 10−3 Ω(cm) by controlling the deposition procedure and postdeposition annealing in hydrogen.
Journal ArticleDOI

Characteristics of high quality ZnO thin films deposited by pulsed laser deposition

TL;DR: In this article, the authors showed that under optimized deposition condition, c-axis oriented ZnO films can be grown having a full width at half maximum (FWHM) value of the (002) x-ray diffraction (XRD) line a factor of 4 smaller than the previously published results using PLD.
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Thick Film ZnO Resistive Gas Sensors Analysis of Their Kinetic Behavior

TL;DR: In this paper, a systematic investigation has been carried out on the time and temperature dependence of the electrical conductivity of ZnO films deposited via spray pyrolysis on ceramic substrates in the temperature range 498-573 K in the presence of dispersed Pt as the catalyst.
Journal ArticleDOI

Properties of conductive zinc oxide films for transparent electrode applications prepared by rf magnetron sputtering

TL;DR: In this article, high-quality zinc oxide (ZnO) films have been obtained with resistivities ranging from about 1 Ω cm to 4.6×10−4 Ωµcm, whereas the average transmission was always greater than 90% between 400 and 800 nm.
Journal ArticleDOI

Controlled texture of reactively rf‐sputtered ZnO thin films

S. Maniv, +1 more
TL;DR: In this paper, a detailed analysis by reflection electron diffraction (RED), x-ray diffraction and scanning electron microscopy (SEM) was performed on thin ZnO layers which were formed under reactive and nonreactive rf•sputtering conditions.
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