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High-Speed Silicon Photonics Modulators

Jeremy Witzens
- Vol. 106, Iss: 12, pp 2158-2182
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TLDR
The focus of this paper lies on the latter capable of supporting both complex-valued modulation and optically broadband operation, with a sense of the limitations of current technology and the potential of novel hybrid material integration.
Abstract
The realization of gigahertz bandwidth modulators out of silicon-based technology in the early 2000s marked a cornerstone of silicon photonics development. While modulation speeds have since progressed well above 50 GHz and satisfy the bandwidth requirements of current and emerging modulation formats, concurrently obtaining low drive voltages and low insertion losses remains a very active area of research. While modulators generally come in two categories, direct absorption and those relying on embedded phase shifters, the focus of this paper lies on the latter capable of supporting both complex-valued modulation and optically broadband operation. The paper provides an overview of the current state of the art, as well as of currently explored improvement paths. First, common phase shifter configurations, aspects related to electrical driving, and associated power consumption are reviewed. Slow-wave, resonant, and plasmonic enhancements are further discussed. The reader is familiarized with the optimization of these devices and provided with a sense of the limitations of current technology and the potential of novel hybrid material integration.

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References
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Journal ArticleDOI

Nanophotonic Pockels modulators on a silicon nitride platform

TL;DR: The authors demonstrate the first electro-optic modulators based on ferroelectric lead zirconate titanate films on silicon nitride, in both the O- and the C-band with a modulation bandwidth beyond 33 GHz and with data rates of 40 Gbps.
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TL;DR: This work presents a 2 × 2 MMI design with a bandwidth of 450nm, an almost fivefold enhancement compared to conventional designs, maintaining insertion loss, power imbalance and MMI phase deviation below 1dB, 0.6dB and 3°, respectively.
Journal ArticleDOI

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TL;DR: A new CMOS-compatible fabrication process involving low temperature RF magnetron sputtering of high-density and low-loss a-TiO(2) that can withstand subsequent elevated-temperature CMOS processes is developed.
Journal ArticleDOI

Athermal operation of Silicon waveguides: spectral, second order and footprint dependencies

TL;DR: The materials selection tradeoffs between high- index contrast (HIC) and low-index contrast (LIC) systems are evaluated and it is shown, remarkably, that FSR and footprint become comparable under the constraint of athermal design.
Journal ArticleDOI

40 Gbit/s low-loss silicon optical modulator based on a pipin diode

TL;DR: Two low-loss silicon optical modulators are demonstrated, based on the carrier depletion effect in a pipin diode, to generate a good compromise between high efficiency, speed and low optical loss.
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