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Journal ArticleDOI

Large‐band‐gap SiC, III‐V nitride, and II‐VI ZnSe‐based semiconductor device technologies

TLDR
In this article, the authors compare the performance of SiC, GaN, and ZnSe for high-temperature electronics and short-wavelength optical applications and conclude that SiC is the leading contender for high temperature and high power applications if ohmic contacts and interface state densities can be further improved.
Abstract
In the past several years, research in each of the wide‐band‐gap semiconductors, SiC, GaN, and ZnSe, has led to major advances which now make them viable for device applications. The merits of each contender for high‐temperature electronics and short‐wavelength optical applications are compared. The outstanding thermal and chemical stability of SiC and GaN should enable them to operate at high temperatures and in hostile environments, and also make them attractive for high‐power operation. The present advanced stage of development of SiC substrates and metal‐oxide‐semiconductor technology makes SiC the leading contender for high‐temperature and high‐power applications if ohmic contacts and interface‐state densities can be further improved. GaN, despite fundamentally superior electronic properties and better ohmic contact resistances, must overcome the lack of an ideal substrate material and a relatively advanced SiC infrastructure in order to compete in electronics applications. Prototype transistors have been fabricated from both SiC and GaN, and the microwave characteristics and high‐temperature performance of SiC transistors have been studied. For optical emitters and detectors, ZnSe, SiC, and GaN all have demonstrated operation in the green, blue, or ultraviolet (UV) spectra. Blue SiC light‐emitting diodes (LEDs) have been on the market for several years, joined recently by UV and blue GaN‐based LEDs. These products should find wide use in full color display and other technologies. Promising prototype UV photodetectors have been fabricated from both SiC and GaN. In laser development, ZnSe leads the way with more sophisticated designs having further improved performance being rapidly demonstrated. If the low damage threshold of ZnSe continues to limit practical laser applications, GaN appears poised to become the semiconductor of choice for short‐wavelength lasers in optical memory and other applications. For further development of these materials to be realized, doping densities (especially p type) and ohmic contact technologies have to be improved. Economies of scale need to be realized through the development of larger SiC substrates. Improved substrate materials, ideally GaN itself, need to be aggressively pursued to further develop the GaN‐based material system and enable the fabrication of lasers. ZnSe material quality is already outstanding and now researchers must focus their attention on addressing the short lifetimes of ZnSe‐based lasers to determine whether the material is sufficiently durable for practical laser applications. The problems related to these three wide‐band‐gap semiconductor systems have moved away from materials science toward the device arena, where their technological development can rapidly be brought to maturity.

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Citations
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Journal ArticleDOI

Strain effects on optical gain in wurtzite GaN

TL;DR: In this paper, the effect of biaxially strained wurtzite GaN on optical gain in hexagonal bulk GaN was analyzed in terms of the change in the effective hexagonal crystal field component.
Journal ArticleDOI

Experimental evidence of α → β phase transformation in SiC quantum dots and their size-dependent luminescence

TL;DR: In this article, the α → β phase transformation can occur at ambient temperature and pressure in nanoscale SiC polytypes under extreme conditions such as high pressure or temperature, but it remains unknown whether phase transformations can occur under normal conditions.
Journal ArticleDOI

Fabrication of GaN mesa structures

TL;DR: In this paper, Ni-Ni-Omic contacts were used as masks for GaN reactive ion etching (RIE) in a CCI2F2/Ar gas mixture.
Journal ArticleDOI

Tailoring Semiconductor Lateral Multijunctions for Giant Photoconductivity Enhancement.

TL;DR: This work exemplifies the technological potential of atomically thin lateral heterostructures in optoelectronic applications and demonstrates that the local photoconductivity in the alloy region can be tailored and enhanced by two orders of magnitude over pure WS2.
Journal ArticleDOI

The electron mobility and compensation in n-type GaN

TL;DR: In this article, a simple model of auto-compensation, based on native defects in GaN, was proposed, which provides an explanation of this observation. But this model assumes that the defect is a complex of a single gallium vacancy partly neutralized by two donors, the complex being favored by Coulomb attraction between the species.
References
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Journal ArticleDOI

General Relationship for the Thermal Oxidation of Silicon

TL;DR: In this paper, the thermaloxidation kinetics of silicon are examined in detail based on a simple model of oxidation which takes into account the reactions occurring at the two boundaries of the oxide layer as well as the diffusion process, the general relationship x02+Ax0=B(t+τ) is derived.
Journal ArticleDOI

Metalorganic vapor phase epitaxial growth of a high quality GaN film using an AlN buffer layer

TL;DR: In this article, the growth condition dependence of crystalline quality is also studied, and the narrowest x-ray rocking curve from the (0006) plane is 2.70' and from the 2024 plane is 1.86' on sapphire substrates.
Journal ArticleDOI

P-Type Conduction in Mg-Doped GaN Treated with Low-Energy Electron Beam Irradiation (LEEBI)

TL;DR: In this article, the p-n junction LED using Mg-doped GaN treated with low-energy electron-beam irradiation (LEEBI) was reported for the first time.
PatentDOI

Blue-green laser diode

TL;DR: In this article, a II-VI compound semiconductor laser diode is formed from overlaying layers of material including an n-type single crystal semiconductor substrate (12), adjacent N-type and p-type guiding lasers (14), a quantum well active layer (18), and a second electrode (30) is characterized by a Fermi energy, with shallow acceptors having a shallow acceptor energy, to a net acceptor concentration of at least 1 x 1017 cm 3.
Journal ArticleDOI

The preparation and properties of vapor- deposited single-crystalline GaN

TL;DR: Vapor deposited GaN single crystals tested for electrical and optical properties, determining band gap energy, electron concentration, etc as mentioned in this paper, were tested for testing the properties of single crystals.
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