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Journal ArticleDOI

Large‐band‐gap SiC, III‐V nitride, and II‐VI ZnSe‐based semiconductor device technologies

TLDR
In this article, the authors compare the performance of SiC, GaN, and ZnSe for high-temperature electronics and short-wavelength optical applications and conclude that SiC is the leading contender for high temperature and high power applications if ohmic contacts and interface state densities can be further improved.
Abstract
In the past several years, research in each of the wide‐band‐gap semiconductors, SiC, GaN, and ZnSe, has led to major advances which now make them viable for device applications. The merits of each contender for high‐temperature electronics and short‐wavelength optical applications are compared. The outstanding thermal and chemical stability of SiC and GaN should enable them to operate at high temperatures and in hostile environments, and also make them attractive for high‐power operation. The present advanced stage of development of SiC substrates and metal‐oxide‐semiconductor technology makes SiC the leading contender for high‐temperature and high‐power applications if ohmic contacts and interface‐state densities can be further improved. GaN, despite fundamentally superior electronic properties and better ohmic contact resistances, must overcome the lack of an ideal substrate material and a relatively advanced SiC infrastructure in order to compete in electronics applications. Prototype transistors have been fabricated from both SiC and GaN, and the microwave characteristics and high‐temperature performance of SiC transistors have been studied. For optical emitters and detectors, ZnSe, SiC, and GaN all have demonstrated operation in the green, blue, or ultraviolet (UV) spectra. Blue SiC light‐emitting diodes (LEDs) have been on the market for several years, joined recently by UV and blue GaN‐based LEDs. These products should find wide use in full color display and other technologies. Promising prototype UV photodetectors have been fabricated from both SiC and GaN. In laser development, ZnSe leads the way with more sophisticated designs having further improved performance being rapidly demonstrated. If the low damage threshold of ZnSe continues to limit practical laser applications, GaN appears poised to become the semiconductor of choice for short‐wavelength lasers in optical memory and other applications. For further development of these materials to be realized, doping densities (especially p type) and ohmic contact technologies have to be improved. Economies of scale need to be realized through the development of larger SiC substrates. Improved substrate materials, ideally GaN itself, need to be aggressively pursued to further develop the GaN‐based material system and enable the fabrication of lasers. ZnSe material quality is already outstanding and now researchers must focus their attention on addressing the short lifetimes of ZnSe‐based lasers to determine whether the material is sufficiently durable for practical laser applications. The problems related to these three wide‐band‐gap semiconductor systems have moved away from materials science toward the device arena, where their technological development can rapidly be brought to maturity.

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Citations
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Journal ArticleDOI

Photoluminescence measurement of ingan and gan grown by a gas-source molecular-beam epitaxy method

TL;DR: In this paper, a gas-source molecular-beam epitaxy method was used to grow GaN and InxGa1−xN using Sapphire substrates for GaN growth.
Journal ArticleDOI

GaN-Based MSM Photodetectors Prepared on Patterned Sapphire Substrates

TL;DR: In this paper, a GaN-based metal-semiconductor-metal ultraviolet photodetectors (PDs) were fabricated and characterized on a patterned sapphire substrate (PSS).
Journal ArticleDOI

Low temperature annealing of 4H–SiC Schottky diode edge terminations formed by 30 keV Ar+ implantation

TL;DR: In this article, annealing of Schottky barrier diodes has been used to reduce the reverse bias leakage current in a post-implant setting at a temperature of 600°C.
Journal ArticleDOI

Formation of epitaxial Ti-Si-C Ohmic contact on 4H-SiC C face using pulsed-laser annealing

TL;DR: In this paper, an epitaxial Ti-Si-C Ohmic contacts on the 4H-SiC C-face for SiC power devices by pulsed-laser annealing were demonstrated.
Journal ArticleDOI

Direct synthesis of aligned silicon carbide nanowires from the silicon substrates

TL;DR: Aligned silicon carbide nanowires were synthesized directly from the silicon substrates via a novel catalytic reaction with a methane-hydrogen mixture at 1,100 degrees C, and X-ray diffraction, Raman, and infrared spectroscopy confirm the synthesis of high-purity silicon carbides.
References
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Journal ArticleDOI

General Relationship for the Thermal Oxidation of Silicon

TL;DR: In this paper, the thermaloxidation kinetics of silicon are examined in detail based on a simple model of oxidation which takes into account the reactions occurring at the two boundaries of the oxide layer as well as the diffusion process, the general relationship x02+Ax0=B(t+τ) is derived.
Journal ArticleDOI

Metalorganic vapor phase epitaxial growth of a high quality GaN film using an AlN buffer layer

TL;DR: In this article, the growth condition dependence of crystalline quality is also studied, and the narrowest x-ray rocking curve from the (0006) plane is 2.70' and from the 2024 plane is 1.86' on sapphire substrates.
Journal ArticleDOI

P-Type Conduction in Mg-Doped GaN Treated with Low-Energy Electron Beam Irradiation (LEEBI)

TL;DR: In this article, the p-n junction LED using Mg-doped GaN treated with low-energy electron-beam irradiation (LEEBI) was reported for the first time.
PatentDOI

Blue-green laser diode

TL;DR: In this article, a II-VI compound semiconductor laser diode is formed from overlaying layers of material including an n-type single crystal semiconductor substrate (12), adjacent N-type and p-type guiding lasers (14), a quantum well active layer (18), and a second electrode (30) is characterized by a Fermi energy, with shallow acceptors having a shallow acceptor energy, to a net acceptor concentration of at least 1 x 1017 cm 3.
Journal ArticleDOI

The preparation and properties of vapor- deposited single-crystalline GaN

TL;DR: Vapor deposited GaN single crystals tested for electrical and optical properties, determining band gap energy, electron concentration, etc as mentioned in this paper, were tested for testing the properties of single crystals.
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