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Memristive-based in-memory computing: from device to large-scale CMOS integration

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The article was published on 2021-11-18 and is currently open access. It has received 1 citations till now. The article focuses on the topics: Scale (ratio).

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Journal ArticleDOI

Implementation of Device-to-Device and Cycle-to-Cycle Variability of Memristive Devices in Circuit Simulations

TL;DR: In this paper , a statistical procedure for the extraction of parameters of a compact model for memristive devices is presented, in which the typical fluctuations of the currentvoltage (I-V) characteristics from D2D and from cycle-to-cycle (C2C) can be emulated.
References
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Journal ArticleDOI

Metal–Oxide RRAM

TL;DR: The physical mechanism, material properties, and electrical characteristics of a variety of binary metal-oxide resistive switching random access memory (RRAM) are discussed, with a focus on the use of RRAM for nonvolatile memory application.
Journal ArticleDOI

Neuromorphic computing using non-volatile memory

TL;DR: The relevant virtues and limitations of these devices are assessed, in terms of properties such as conductance dynamic range, (non)linearity and (a)symmetry of conductance response, retention, endurance, required switching power, and device variability.
Journal ArticleDOI

The mechanism of electroforming of metal oxide memristive switches

TL;DR: The nature of the oxide electroforming as an electro-reduction and vacancy creation process caused by high electric fields and enhanced by electrical Joule heating is explained with direct experimental evidence.
Journal ArticleDOI

Thermochemical description of dielectric breakdown in high dielectric constant materials

TL;DR: In this article, a thermochemical/molecular model was developed for breakdown in high dielectric constant materials and the model suggests that a fundamental relationship exists between breakdown strength (Ebd) and dielectoric constant (k).
Proceedings ArticleDOI

On the stochastic nature of resistive switching in metal oxide RRAM: Physical modeling, monte carlo simulation, and experimental characterization

TL;DR: In this paper, the authors investigated the origin of switching parameter variations in metal oxide resistive switching random access memory (RRAM) and found that the wide spread of high resistance states (HRS) are due to the variation of tunneling gap distances.
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