Production of nanometric particles in radio frequency glow discharges in mixtures of silane and methane
TLDR
In this paper, the a−Si1−xCx:H powders were obtained from different precursor gas mixtures, from R=0.05 to R=9, where R=[SiH4]/([SiH 4]+[CH4])...Abstract:
The formation of silicon particles in rf glow discharges has attracted attention due to their effect as a contaminant during film deposition or etching. However, silicon and silicon alloy powders produced by plasma‐enhanced chemical vapor deposition (PECVD) are promising new materials for sintering ceramics, for making nanoscale filters, or for supporting catalytic surfaces. Common characteristics of these powders are their high purity and the easy control of their stoichiometry through the composition of the precursor gas mixture. Plasma parameters also influence their structure. Nanometric powders of silicon–carbon alloys exhibiting microstructural properties such as large hydrogen content and high surface/volume ratio have been produced in a PECVD reactor using mixtures of silane and methane at low pressure (<1 Torr) and low frequency square‐wave modulated rf power (13.56 MHz). The a‐Si1−xCx:H powders were obtained from different precursor gas mixtures, from R=0.05 to R=9, where R=[SiH4]/([SiH4]+[CH4])...read more
Citations
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Journal ArticleDOI
Microwave Plasma Synthesis of Materials—From Physics and Chemistry to Nanoparticles: A Materials Scientist’s Viewpoint
TL;DR: In this paper, microwave plasmas are used for the synthesis of inorganic materials and material groups, including bare Fe2O3 nanoparticles, core/shell ceramic/organic shell nanoparticles and Sn-based nanocomposites.
Patent
Methods and apparatus for the production of group iv nanoparticles in a flow-through plasma reactor
Xuegeng Li,Christopher Alcantara,Maxim Kelman,Elena V. Rogojina,Eric A. Schiff,Mason Terry,Karel Vanheusden +6 more
TL;DR: In this paper, a plasma processing apparatus for producing a set of Group IV semiconductor nanoparticles from a precursor gas is disclosed, which includes an outer dielectric tube, the outer tube including an outer tube inner surface and an outer-tube outer surface, wherein the outer-to-outer inner surface has an inner-surface etching rate.
Journal ArticleDOI
Nanometric powder of stoichiometric silicon carbide produced in square-wave modulated RF glow discharges
TL;DR: In this article, a SiC nanometric powder has been obtained in square-wave modulated radiofrequency glow discharges from CH 4 and SiH 4 gas mixtures, and the effects on the structure of the powder were examined by FTIR, EA, XPS and from optical transmittance measurements.
Journal ArticleDOI
Synthesis and characterization of halogenated amorphous silicon via a novel glow discharge process
Oscar Giraldo,William S. Willis,Manuel Marquez,Steven L. Suib,Yuji Hayashi,Hiroshige Matsumoto +5 more
TL;DR: Amorphous silicon powder has been produced in a tubular glow discharge reactor as discussed by the authors, where reaction were done using SiCl4 discharges of a mixture of hydrogen and helium at atmospheric pressure.
Book ChapterDOI
Nanoparticles from low-pressure, low-temperature plasmas
TL;DR: In this paper, the formation of particles in low-temperature, low-pressure plasmas is discussed and various technological aspects of the formation and characterization of the powders are discussed.
References
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Journal ArticleDOI
On the structural origin of the photoluminescence in silicon powder produced in PECVD processes
TL;DR: In this article, the origin of photoluminescence emitted by silicon powder produced by plasma-enhanced chemical vapor deposition is analyzed in view of the structural changes induced by laser annealing.