R
Ruben Bartali
Researcher at fondazione bruno kessler
Publications - 81
Citations - 1373
Ruben Bartali is an academic researcher from fondazione bruno kessler. The author has contributed to research in topics: Thin film & Sputtering. The author has an hindex of 16, co-authored 79 publications receiving 1063 citations. Previous affiliations of Ruben Bartali include University of Trento & Kessler Foundation.
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Production and processing of graphene and related materials
Claudia Backes,Claudia Backes,Amr M. Abdelkader,Concepción Alonso,Amandine Andrieux-Ledier,Raul Arenal,Raul Arenal,Jon Azpeitia,Nilanthy Balakrishnan,Luca Banszerus,Julien Barjon,Ruben Bartali,Sebastiano Bellani,Claire Berger,Claire Berger,Reinhard Berger,M.M. Bernal Ortega,Carlo Bernard,Peter H. Beton,André Beyer,Alberto Bianco,Peter Bøggild,Francesco Bonaccorso,Gabriela Borin Barin,Cristina Botas,Rebeca A. Bueno,Daniel Carriazo,Andres Castellanos-Gomez,Meganne Christian,Artur Ciesielski,Tymoteusz Ciuk,Matthew T. Cole,Jonathan N. Coleman,Camilla Coletti,Luigi Crema,Huanyao Cun,Daniela Dasler,Domenico De Fazio,Noel Díez,Simon Drieschner,Georg S. Duesberg,Roman Fasel,Roman Fasel,Xinliang Feng,Alberto Fina,Stiven Forti,Costas Galiotis,Costas Galiotis,Giovanni Garberoglio,Jorge M. Garcia,Jose A. Garrido,Marco Gibertini,Armin Gölzhäuser,Julio Gómez,Thomas Greber,Frank Hauke,Adrian Hemmi,Irene Hernández-Rodríguez,Andreas Hirsch,Stephen A. Hodge,Yves Huttel,Peter Uhd Jepsen,I. Jimenez,Ute Kaiser,Tommi Kaplas,HoKwon Kim,Andras Kis,Konstantinos Papagelis,Konstantinos Papagelis,Kostas Kostarelos,Aleksandra Krajewska,Kangho Lee,Changfeng Li,Harri Lipsanen,Andrea Liscio,Martin R. Lohe,Annick Loiseau,Lucia Lombardi,María Francisca López,Oliver Martin,Cristina Martín,Lidia Martínez,José A. Martín-Gago,José I. Martínez,Nicola Marzari,Alvaro Mayoral,Alvaro Mayoral,John B. McManus,Manuela Melucci,Javier Méndez,Cesar Merino,Pablo Merino,Andreas Meyer,Elisa Miniussi,Vaidotas Miseikis,Neeraj Mishra,Vittorio Morandi,Carmen Munuera,Roberto Muñoz,Hugo Nolan,Luca Ortolani,A. K. Ott,A. K. Ott,Irene Palacio,Vincenzo Palermo,John Parthenios,Iwona Pasternak,Amalia Patanè,Maurizio Prato,Maurizio Prato,Henri Prevost,Vladimir Prudkovskiy,Nicola M. Pugno,Nicola M. Pugno,Nicola M. Pugno,Teófilo Rojo,Antonio Rossi,Pascal Ruffieux,Paolo Samorì,Léonard Schué,Eki J. Setijadi,Thomas Seyller,Giorgio Speranza,Christoph Stampfer,I. Stenger,Wlodek Strupinski,Yuri Svirko,Simone Taioli,Simone Taioli,Kenneth B. K. Teo,Matteo Testi,Flavia Tomarchio,Mauro Tortello,Emanuele Treossi,Andrey Turchanin,Ester Vázquez,Elvira Villaro,Patrick Rebsdorf Whelan,Zhenyuan Xia,Rositza Yakimova,Sheng Yang,G. Reza Yazdi,Chanyoung Yim,Duhee Yoon,Xianghui Zhang,Xiaodong Zhuang,Luigi Colombo,Andrea C. Ferrari,Mar García-Hernández +148 more
TL;DR: In this article, the authors present an overview of the main techniques for production and processing of graphene and related materials (GRMs), as well as the key characterization procedures, adopting a 'hands-on' approach, providing practical details and procedures as derived from literature and from the authors' experience, in order to enable the reader to reproduce the results.
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Optical absorption parameters of amorphous carbon films from Forouhi–Bloomer and Tauc–Lorentz models: a comparative study
TL;DR: In this article, Tauc-Lorentz (TL), Forouhi-Bloomer (FB) and modified FB models were applied to the interband absorption of amorphous carbon films.
Journal Article
TiO 2-x 膜の真正欠陥とその化学及び光学的性質への影響
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Structural and near-infra red luminescence properties of Nd-doped TiO2 films deposited by RF sputtering
Rajesh Pandiyan,Rajesh Pandiyan,Victor Micheli,Davor Ristić,Ruben Bartali,Giancarlo Pepponi,Mario Barozzi,Gloria Gottardi,Maurizio Ferrari,Nadhira Laidani +9 more
TL;DR: In this paper, the effect of neodymium doping of TiO2 thin films produced on quartz, soda lime and silicon substrates by RF co-sputtering of two targets of Nd and metallic Nd was reported.
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Influence of hydrogen addition to an Ar plasma on the structural properties of TiO2−x thin films deposited by RF sputtering
TL;DR: In this article, the influence of hydrogen addition to an Ar plasma on the structural properties of TiO2−x films produced by RF sputtering of a TiO 2 target at room temperature was studied.