scispace - formally typeset
Open AccessJournal ArticleDOI

Coexistence of memory and threshold resistive switching identified by combinatorial screening in niobium-tantalum system

Reads0
Chats0
TLDR
In this article , a combinatorial screening approach was used to reveal improved performance and memory characteristics of memristive devices by using an Nb-Ta thin film library, with a total compositional spread ranging between 13 and 80 at.% Ta alloy.
About
This article is published in Applied Surface Science.The article was published on 2022-12-01 and is currently open access. It has received 1 citations till now. The article focuses on the topics: Memristor & Tantalum.

read more

Citations
More filters
Journal ArticleDOI

Controllable coexistence of threshold and non-volatile crosspoint memory for highly linear synaptic device applications

TL;DR: In this article, a high-k resistive cross-point memory was used for high-density NVM storage in large-scale cross-bar array in future neuromorphic computing applications.
References
More filters
Journal ArticleDOI

Memory devices and applications for in-memory computing

TL;DR: This Review provides an overview of memory devices and the key computational primitives enabled by these memory devices as well as their applications spanning scientific computing, signal processing, optimization, machine learning, deep learning and stochastic computing.
Journal ArticleDOI

Chemical shifts of Auger lines, and the Auger parameter

TL;DR: In this article, the role of polarizability in determining the position of core-type Auger lines has been investigated and the Auger parameter has been shown to be accurately determinable to ± 0.1 eV.
Journal ArticleDOI

Thin anodic oxide layers on aluminium and other valve metals: high field regime

TL;DR: The formation kinetics and electric properties of anodic barrier oxides on Al, Hf, Nb, Ta, Ti, and Zr depend on the migration of ions, controlled by an electric field strength of up to 107 V cm−1.
Journal ArticleDOI

Recommended Methods to Study Resistive Switching Devices

TL;DR: This manuscript describes the most recommendable methodologies for the fabrication, characterization, and simulation of RS devices, as well as the proper methods to display the data obtained.
Journal ArticleDOI

Summary of ISO/TC 201 Standard: VII ISO 15472 : 2001—surface chemical analysis—x-ray photoelectron spectrometers—calibration of energy scales

TL;DR: In this paper, the binding energy scales of x-ray photoelectron spectrometers were calibrated for general analytical purposes using unmonochromated Al or Mg x-rays or monochromate Al x-rams.
Related Papers (5)