Journal ArticleDOI
Combination photo and electron beam lithography with polymethyl methacrylate (PMMA) resist.
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TLDR
Techniques for performing photolithography and electron beam lithography in succession on the same resist-covered substrate are described and it is demonstrated that such resists are sensitive to both ultraviolet and electronbeam irradiation.Abstract:
We describe techniques for performing photolithography and electron beam lithography in succession on the same resist-covered substrate. Larger openings are defined in the resist film through photolithography whereas smaller openings are defined through conventional electron beam lithography. The two processes are carried out one after the other and without an intermediate wet development step. At the conclusion of the two exposures, the resist film is developed once to reveal both large and small openings. Interestingly, these techniques are applicable to both positive and negative tone lithographies with both optical and electron beam exposure. Polymethyl methacrylate, by itself or mixed with a photocatalytic cross-linking agent, is used for this purpose. We demonstrate that such resists are sensitive to both ultraviolet and electron beam irradiation. All four possible combinations, consisting of optical and electron beam lithographies, carried out in positive and negative tone modes have been described. Demonstration grating structures have been shown and process conditions have been described for all four cases.read more
Citations
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Journal ArticleDOI
Encapsulated Dye/Polymer Nanoparticles Prepared via Miniemulsion Polymerization for Inkjet Printing.
TL;DR: Results suggest that the miniemulsion ink is a potential substitute for inks based on traditional dyes in inkjet printing, due to its simple operation and minimal generation of pollutants.
Journal ArticleDOI
Advancing next generation nanolithography with infiltration synthesis of hybrid nanocomposite resists
Nikhil Tiwale,Ashwanth Subramanian,Kim Kisslinger,Ming Lu,Jiyoung Kim,Aaron Stein,Chang-Yong Nam,Chang-Yong Nam +7 more
TL;DR: In this article, a hybrid positive-tone resist platform utilizing simple ex situ vapor-phase inorganic infiltration into standard resist materials was demonstrated for electron-beam lithography patterning, featuring a fully controllable critical exposure dose, contrast, and etch resistance.
Journal ArticleDOI
A review of polymethyl methacrylate (PMMA) as a versatile lithographic resist – With emphasis on UV exposure
TL;DR: In this paper, the utility of polymethyl methacrylate (PMMA) as a resist material for several types of lithographic processes is discussed, including the use of resist reflow for three-dimensional structure fabrication and tone switching with change in UV exposure dose.
Journal ArticleDOI
Augmenting mask-based lithography with direct laser writing to increase resolution and speed.
Miles P. Lim,Xiaofei Guo,Eva L. Grunblatt,Garrett M. Clifton,Ayda N. Gonzalez,Christopher N. LaFratta +5 more
TL;DR: A new method of hybrid photolithography, Laser Augmented Microlithographic Patterning (LAMP), is described in which direct laser writing is used to define additional features to those made with an inexpensive transparency mask, and enables high resolution prototypes to be created, tested, and modified quickly.
Journal ArticleDOI
Controlling the properties of radiation-synthesized thermoresponsive oligoether methacrylate hydrogels by varying the monomer side-chain length; self-composite network containing crystalline phase
Krzysztof Piechocki,Marcin Kozanecki,Slawomir Kadlubowski,Barbara Pacholczyk-Sienicka,Piotr Ulanski,Tadeusz Biela +5 more
TL;DR: A series of thermo-responsive hydrogels have been synthesized by radiation-induced crosslinking polymerization in bulk based on; oligoether methacrylates (OEGMAs) of side chain lengths of 2-19 EG; monomer units.
References
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Journal ArticleDOI
Electron beam lithography: resolution limits and applications
Christophe Vieu,Franck Carcenac,A. Pépin,Yong Chen,M. Mejias,A. Lebib,L. Manin-Ferlazzo,L. Couraud,H. Launois +8 more
TL;DR: In this article, the authors report on the resolution limits of EBL in the conventional polymethylmethacrylate (PMMA) organic resist and show that resolution can be pushed below 10 nm for isolated features and dense arrays of periodic structures can be fabricated at a pitch of 30 nm, leading to a density close to 700 Gbit/in2.
Journal ArticleDOI
Nanofabrication by electron beam lithography and its applications
TL;DR: In this article, a review of electron beam lithography (EBL) based nanofabrication techniques for pattern transfer is presented, focusing on how to apply the property of EBL resists for constructing multilayer stacks towards pattern transfer.
Journal ArticleDOI
Lithographic Imaging Techniques for the Formation of Nanoscopic Features
Journal ArticleDOI
Degradation of poly(methylmethacrylate) by deep ultraviolet, x‐ray, electron beam, and proton beam irradiations
TL;DR: In this paper, the chemical changes in poly(methylmethacrylate) (PMMA) caused by irradiation with deep ultraviolet (UV), x-ray, electron, and proton beams were studied by gel permeation chromatography, Fourier transform infrared, and UV spectroscopy.
Journal ArticleDOI
Crosslinked PMMA as a high-resolution negative resist for electron beam lithography and applications for physics of low-dimensional structures
TL;DR: In this paper, a crosslinked PMMA is employed as a high-resolution negative resist for electron beam lithography, which allows the patterning of submicrometre features in an insulating layer, thus simplifying the fabrication process of various multilayer devices.
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