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Conductive and Stable Magnesium Oxide Electron‐Selective Contacts for Efficient Silicon Solar Cells

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TLDR
In this paper, the authors demonstrate a highly conductive and thermally stable electrode composed of a magnesium oxide/aluminium (MgOx/Al) contact, achieving moderately low resistivity Ohmic contacts on lightly doped n-type c-Si.
Abstract
A high Schottky barrier (>0.65 eV) for electrons is typically found on lightly doped n-type crystalline (c-Si) wafers for a variety of contact metals. This behavior is commonly attributed to the Fermi-level pinning effect and has hindered the development of n-type c-Si solar cells, while its p-type counterparts have been commercialized for several decades, typically utilizing aluminium alloys in full-area, and more recently, partial-area rear contact configurations. Here the authors demonstrate a highly conductive and thermally stable electrode composed of a magnesium oxide/aluminium (MgOx/Al) contact, achieving moderately low resistivity Ohmic contacts on lightly doped n-type c-Si. The electrode, functionalized with nanoscale MgOx films, significantly enhances the performance of n-type c-Si solar cells to a power conversion efficiency of 20%, advancing n-type c-Si solar cells with full-area dopant-free rear contacts to a point of competitiveness with the standard p-type architecture. The low thermal budget of the cathode formation, its dopant-free nature, and the simplicity of the device structure enabled by the MgOx/Al contact open up new possibilities in designing and fabricating low-cost optoelectronic devices, including solar cells, thin film transistors, or light emitting diodes.

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Passivating contacts for crystalline silicon solar cells

TL;DR: De Wolf et al. as mentioned in this paper reviewed the fundamental physical processes governing contact formation in crystalline silicon (c-Si) and identified the role passivating contacts play in increasing c-Si solar cell efficiencies beyond the limitations imposed by heavy doping and direct metallization.
Journal ArticleDOI

Passivating Contacts for Crystalline Silicon Solar Cells: From Concepts and Materials to Prospects

TL;DR: In this paper, the authors discuss the design guidelines for passivating contacts and outline their prospects, and present an overview and classification of work to date on passivating contact structures in c-Si solar cells.
Journal ArticleDOI

Surface passivation of crystalline silicon solar cells: Present and future

TL;DR: In this paper, the authors focus on the future developments in the field of c-Si solar cells based on carrier-selective passivation layers and compare combinations of the various options of carrierselective layers concerning their combined selectivities and efficiency potentials.
Journal ArticleDOI

Dielectric surface passivation for silicon solar cells: A review

TL;DR: A review of the dielectric passivation coatings developed in the past two decades using a standardised methodology to characterise the metrics of surface recombination across all techniques and materials is provided in this article.
References
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Semiconductor Material and Device Characterization

TL;DR: In this article, the authors present a characterization of the resistivity of a two-point-versus-four-point probe in terms of the number of contacts and the amount of contacts in the probe.
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Achievement of More Than 25% Conversion Efficiency With Crystalline Silicon Heterojunction Solar Cell

TL;DR: In this article, the structure of an interdigitated back contact was adopted with crystalline silicon heterojunction solar cells to reduce optical loss from a front grid electrode, a transparent conducting oxide (TCO) layer, and a-Si:H layers as an approach for exceeding the conversion efficiency of 25%.
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Light trapping properties of pyramidally textured surfaces

TL;DR: In this paper, the light trapping properties of textured optical sheets have become of recent interest in photovoltaic energy conversion since light trapping allows a significant reduction in the thickness of active solar cell material.
Journal ArticleDOI

Anisotropic etching of silicon in TMAH solutions

TL;DR: In this article, the tetramethyl ammonium hydroxide (TMAH, (CH3)4NOH) was used for silicon anisotropic etching solutions with various concentrations from 5 to 40 wt.% and temperatures from 60 to 90 °C.
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