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Journal ArticleDOI

Metalorganic chemical vapor deposition of III‐V semiconductors

M. J. Ludowise
- 15 Oct 1985 - 
- Vol. 58, Iss: 8
TLDR
In this paper, the metalorganic chemical vapor deposition (MOCVD) of epitaxial III-V semiconductor alloys on III-v substrates is reviewed in detail.
Abstract
The metalorganic chemical vapor deposition (MOCVD) of epitaxial III‐V semiconductor alloys on III‐V substrates is reviewed in detail. The emphasis is placed on both practical and theoretical knowledge of the equipment and deposition process. The chemistry of the source alkyls and the dynamics of the transport process are discussed. The growth of the GaAs and AlxGa1−xAs systems are treated as prototypical examples (and the most studied) of the III‐V materials. Latter sections review InP, Ga1−xInxAs, and related alloys. Finally, the antimonide and the other systems are reviewed. Electronic and optical devices fabricated from MOCVD‐grown materials are used as examples of the capabilities of the growth technique.

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Citations
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1012 bit/s optoelectronics technology

TL;DR: In this paper, the configurational, physical, and material constraints which prevent devices from operating at this speed, and can these constraints be altered? If 1012 bit/s can indeed be reached, what system functional building blocks should be generated?
Journal ArticleDOI

Thin upper‐confining layer AlxGa1−xAs‐GaAs quantum well heterostructure laser diodes

TL;DR: AlxGa1−xAs−As−GaAs•GaAs quantum well heterostructure (QWH) laser diodes with much thinner upper confining layers (06, 045, 03, and 02 μm) are demonstrated in this paper.
Journal ArticleDOI

Resonance and switching in a native‐oxide‐defined AlxGa1−xAs‐GaAs quantum‐well heterostructure laser array

TL;DR: In this paper, a stripe-geometry coupled two-dimensional array is described that exhibits mode switching and multiple switching (ON-OFF twice) in the light power (L) versus current (I) characteristics with increasing current.
Journal ArticleDOI

Kinetics of the thermal decomposition of alkyl derivatives of Group III and V elements

TL;DR: In this article, the results of kinetic studies on the thermal decomposition of alkyl derivatives of Group III and V elements, used to obtain semiconducting epitaxial structures, are surveyed.
Journal ArticleDOI

Reduced temperature sensitivity AlxGa1−xAs‐GaAs quantum well lasers with (Si2)x(GaAs)1−x ‘‘barriers’’

TL;DR: The temperature dependence of threshold current of quantum well heterostructure (QWH) laser diodes is reduced by inserting (Si2)x(GaAs)1−x barriers in the active region as mentioned in this paper.
References
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Journal ArticleDOI

Thermal expansion of some diamondlike crystals

TL;DR: The thermal expansion of AlN, cubic BN, and BP has been measured from 77 to 1300 K by x−ray techniques as mentioned in this paper, and the derived thermal expansion coefficients are compared with those of diamond, Si, Ge, SiC, GaP, and BeO using the Debye temperature as a scaling parameter.
Journal ArticleDOI

Single-crystal gallium arsenide on insulating substrates

TL;DR: In this article, a single-crystal growth of gallium arsenide was achieved on a number of singlecrystal insulating oxide substrates, including sapphire, spinel, beryllium oxide, and thorium oxide.
Journal ArticleDOI

The Use of Metal‐Organics in the Preparation of Semiconductor Materials I . Epitaxial Gallium‐ V Compounds

TL;DR: In this article, the decomposition of alkyl-gallium compounds in the presence of arsine, phosphine, arsinesinephosphine, and stibine mixtures has been used for compound semiconductor film growth compatible with methods used for the growth of elemental semiconductors.
Journal ArticleDOI

The importance of lattice mismatch in the growth of GaxIn1−xP epitaxial crystals

TL;DR: In this paper, the importance of lattice-parameter mismatch between the GaAs substrate and the GaxIn1−xP epitaxial layer on crystal growth and properties has been investigated.
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