3M

About: 3M is a company organization based out in Saint Paul, Minnesota, United States. It is known for research contribution in the topics: Layer (electronics) & Coating. The organization has 7603 authors who have published 7907 publications receiving 254227 citations. The organization is also known as: Minnesota Mining and Manufacturing Company & 3M Company.

Disposable diaper with improved hook and loop fastener system

Abstract: A disposable garment or diaper including a laminate and a hook and loop fastener for fastening together portions of the laminate to secure the diaper to an individual. The fastener includes a loop fastener portion adjacent a first end of the laminate comprising a multiplicity of loops, a pair of flexible elongate polymeric tab assemblies having first end portions attached at opposite sides to the laminate adjacent a second end of the laminate and having distal end portions unattached to the laminate, and hook fastener portions at the distal end portions of the tab assemblies comprising a plurality of projecting hook members adapted to make releasable engagement with the loops. The tab assemblies include a layer of pressure sensitive adhesive on the distal end portions adjacent the hook fastener portion which can, after the diaper has been soiled and removed from the individual, be used for securing the soiled diaper in a rolled or folded condition surrounding the soiled portion of the diaper to facilitate its disposal by engagement of the layer of pressure sensitive adhesive with the laminate.

Inelastic, heat-elasticizable sheet material for diapers

Abstract: Flat, inelastic, dimensionally stable sheet material is formed by stretching parallel elastomeric strands to several times their relaxed length and then bonding them to one or more flat, inelastic webs with inelastic thermoplastic polymer. When the sheet material is heated, the strands contract and the sheet material shirrs. Strips of the flat sheet material can be incorporated in disposable diapers and subsequently shirred to provide elastic waistbands or leg openings.

Ceramic alumina abrasive grains seeded with iron oxide

Abstract: A process of producing alpha alumina ceramic abrasive grain by sintering alpha alumina monohydrate is improved by seeding with a crystalline oxide of iron having a particle size of less than 150 nm.

Method of making alpha alumina-based abrasive grain containing silica and iron oxide

Abstract: A method of making an alpha alumina-based ceramic abrasive grain comprising, on a theoretical oxide basis, Al2 O3, Fe2 O3, and SiO2. The abrasive grain has a surface roughness height of greater than about 200 nanometers and a density of greater than about 3.50 g/cm3. Preferably, the alpha alumina-based ceramic abrasive grain has alpha alumina crystallites having an average crystallite size of less than about 0.5 micrometer (more preferably, less than about 0.3 micrometer). The presence of the SiO2 in combination with Fe2 O3 increases the amount of transgranular fracture of the abrasive grain, reduces the alpha alumina crystallite growth during sintering of the abrasive grain, dilates at least one of the unit cell dimensions of the abrasive grain, and generally improves the grinding performance of the abrasive grain.

Photolabile blocked surfactants and compositions containing the same

Abstract: Surfactants which are blocked against surfactant action (identified herein as "photolabile blocked surfactants") by a photolabile protective or masking group but which, on exposure to actinic radiation, become unblocked are provided. Coating compositions in which surfactant is formed on irradiation are provided by blending the photolabile blocked surfactant with polymeric film-forming materials. Compositions containing the photolabile blocked surfactants are useful when employed as protective coatings on various substrates or as the adhesive in a pressure sensitive adhesive tape. Although initially well adhering to a substrate, such compositions may be readily removed from the substrate following exposure of the same to suitable radiation which unblocks the surfactant to permit it to regain its surfactant activity.