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Journal ArticleDOI

Analysis and modeling of anomalous flicker noise in long channel halo MOSFETs

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TLDR
In this article, a sub-circuit model for 1/f noise was proposed to detect the anomalous behavior of drain current power spectral density (SID) with the variation in drain voltage.
Abstract
Halo implanted MOSFETs exhibit anomalous behavior in drain current power spectral density ( S ID ) of flicker noise (1/f) with the variation in drain voltage, but this behavior cannot be captured by existing 1/f models. To identify the reasons for this abnormal behavior of 1/f noise, we have performed experimentally calibrated technology computer-aided design (TCAD) simulations. We find that this anomalous behavior comes from the drain-side halo region, and it has complex dependence on the bias and geometry. We propose a sub-circuit model for 1 / f noise that successfully captures the anomalous behavior of S ID with the drain bias. This model calculates the individual contributions and the impact of different device regions, such as the source side halo, channel, and drain side halo, on the overall noise of the device. The proposed model is in good agreement with the experimentally calibrated TCAD simulations for different geometries, biases, and temperatures. The proposed model is also validated with the measurement data.

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Citations
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Journal ArticleDOI

Substrate Noise Evaluation for Lightly Doped 45nm N-MOSFET Using Physical Simulation Models

TL;DR: In this article , a hot carrier injection model was used to measure noise at an n-channel MOSFET (NMOS) substrate using a low-signal equivalent circuit.
References
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Journal ArticleDOI

Low-frequency fluctuations in solids: 1/f noise

TL;DR: In this article, the authors deal with selected topics regarding the properties of simple condensed matter systems, especially metals, and find that considerable experimental and conceptual progress has been made, but specific physical processes mostly remain to be identified.
Journal ArticleDOI

A unified model for the flicker noise in metal-oxide-semiconductor field-effect transistors

TL;DR: In this paper, a unified flicker noise model which incorporates both the number fluctuation and the correlated surface mobility fluctuation mechanism is discussed, which can unify the noise data reported in the literature, without making any ad hoc assumption on the noise generation mechanism.
Journal ArticleDOI

Improved Analysis of Low Frequency Noise in Field‐Effect MOS Transistors

TL;DR: In this article, an improved analysis of low frequency trapping noise in a MOS device is proposed, taking into account the supplementary fluctuations of the mobility induced by those of the interface charge, which enables an adequate description of the gate voltage dependence of the input equivalent gate voltage noise to be obtained in various actual situations.
Journal ArticleDOI

Noise modeling for RF CMOS circuit simulation

TL;DR: In this paper, a nonquasi-static channel segmentation model was proposed to predict both drain and gate current noise in 0.18-/spl mu/m CMOS technology.
Journal ArticleDOI

1/f noise in MOS devices, mobility or number fluctuations?

TL;DR: In this paper, the effects of scaling down on the 1/f noise in MOS transistors are studied in the ohmic region as well as in saturation, where the contribution of the gatevoltage-dependent series resistance on the drain side plays a role in lightly doped drain mini-MOST's.
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