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Analytical surface potential modeling and simulation of junction-less double gate (JLDG) MOSFET for ultra low-power analog/RF circuits

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TLDR
The purpose of this research is to provide a physical explanation for improved analog and RF performance exhibited by the device.
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This article is published in Microelectronics Journal.The article was published on 2015-10-01. It has received 38 citations till now. The article focuses on the topics: Channel length modulation & MOSFET.

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Citations
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Journal ArticleDOI

A review on performance comparison of advanced MOSFET structures below 45 nm technology node

TL;DR: In this article, several gate and channel engineered MOSFET structures are analyzed and compared for sub 45 nm technology node for analog/RF performance in terms of IOFF, subthreshold performance parameters and DIBL values.
Journal ArticleDOI

Improved analog/RF performance of double gate junctionless MOSFET using both gate material engineering and drain/source extensions

TL;DR: In this article, the authors proposed a new double gate junctionless (DGJ) MOSFET design based on both gate material engineering and drain/source extensions, where the proposed device shows excellent ability in improving the analog/RF performance and provides higher drain current and improved figures-of-merit as compared to the conventional DGJ MOSFL.
Journal ArticleDOI

Reliability analysis of Junction-less Double Gate (JLDG) MOSFET for analog/RF circuits for high linearity applications

TL;DR: Thermal stability of the JLDG MOSFET has been tested for operating the device over a wide range of temperatures ranging from 200K to 500K, so that the effect of temperature on the performance issues remains limited.
Journal ArticleDOI

Impact of thin high-k dielectrics and gate metals on RF characteristics of 3D double gate junctionless transistor

TL;DR: In this article, the performance of 3D double gate junctionless transistor (JLT) with 20-nm gate length is investigated considering thin high-k dielectrics and gate metals.
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Linearity Distortion Analysis of Junctionless Quadruple Gate MOSFETs for Analog Applications

TL;DR: In this paper, the authors examined a junctionless quadruple gate (JLQG) MOSFET for analog and linearity distortion performance by numerically calculating transconductance and its higher order derivatives.
References
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Journal ArticleDOI

Nanowire transistors without junctions

TL;DR: A new type of transistor in which there are no junctions and no doping concentration gradients is proposed and demonstrated, which has near-ideal subthreshold slope, extremely low leakage currents, and less degradation of mobility with gate voltage and temperature than classical transistors.
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Device scaling limits of Si MOSFETs and their application dependencies

TL;DR: The end result is that there is no single end point for scaling, but that instead there are many end points, each optimally adapted to its particular applications.
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Junctionless multigate field-effect transistor

TL;DR: In this article, the authors describe a metaloxide-semiconductor MOS transistor concept in which there are no junctions and the channel doping is equal in concentration and type to the source and drain extension doping.
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Frontiers of silicon-on-insulator

TL;DR: In this article, the authors discuss methods of forming silicon-on-insulator (SOI) wafers, their physical properties, and the latest improvements in controlling the structure parameters.
Journal ArticleDOI

Performance estimation of junctionless multigate transistors

TL;DR: In this paper, the authors describe the simulation of the electrical characteristics of a new transistor concept called the junctionless multigate field effect transistor (MuGFET), which has no junctions, a simpler fabrication process, less variability and better electrical properties than classical inversionmode devices with PN junctions at the source and drain.
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