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Open AccessJournal ArticleDOI

Physical electro-thermal model of resistive switching in bi-layered resistance-change memory

TLDR
A complete electro-thermal resistive switching model based on the finite element method is proposed that accurately accounts for the set/reset characteristics, which provides an in-depth understanding of the nature of resistive Switching.
Abstract
Tantalum-oxide-based bi-layered resistance-change memories (RRAMs) have recently improved greatly with regard to their memory performances. The formation and rupture of conductive filaments is generally known to be the mechanism that underlies resistive switching. The nature of the filament has been studied intensively and several phenomenological models have consistently predicted the resistance-change behavior. However, a physics-based model that describes a complete bi-layered RRAM structure has not yet been demonstrated. Here, a complete electro-thermal resistive switching model based on the finite element method is proposed. The migration of oxygen vacancies is simulated by the local temperature and electric field derived from carrier continuity and heat equations fully coupled in a 3-D geometry, which considers a complete bi-layered structure that includes the top and bottom electrodes. The proposed model accurately accounts for the set/reset characteristics, which provides an in-depth understanding of the nature of resistive switching.

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Journal ArticleDOI

Resistive switching memories based on metal oxides: mechanisms, reliability and scaling

TL;DR: This work provides an overview of the current understanding of bipolar-switching RRAM operation, reliability and scaling, and the stability of the low- and high-resistance states will be discussed in terms of conductance fluctuations and evolution in 1D filaments containing only a few atoms.
Journal ArticleDOI

Resistive Random Access Memory (RRAM): an Overview of Materials, Switching Mechanism, Performance, Multilevel Cell (mlc) Storage, Modeling, and Applications

TL;DR: Recent progress in the area of resistive random access memory (RRAM) technology which is considered one of the most standout emerging memory technologies owing to its high speed, low cost, enhanced storage density, potential applications in various fields, and excellent scalability is comprehensively reviewed.
Journal ArticleDOI

Comprehensive Physical Model of Dynamic Resistive Switching in an Oxide Memristor

TL;DR: The proposed model reveals the roles of electric field, temperature, oxygen vacancy concentration gradient, and different material and device parameters on RS and allows accurate predictions of diverse set/reset, analog switching, and complementary RS behaviors using only material-dependent device parameters.
Journal ArticleDOI

Three-dimensional observation of the conductive filament in nanoscaled resistive memory devices.

TL;DR: This Letter reports for the first time on the three-dimensional (3D) observation of the shape of the conductive filament and concludes that the dynamic filament-growth is limited by the cation transport.
Journal ArticleDOI

Brain-inspired computing with memristors: Challenges in devices, circuits, and systems

TL;DR: This article provides a review of current development and challenges in brain-inspired computing with memristors and survey the progress of memristive spiking and artificial neural networks.
References
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Journal ArticleDOI

Memristive devices for computing

TL;DR: The performance requirements for computing with memristive devices are examined and how the outstanding challenges could be met are examined.
Journal ArticleDOI

A fast, high-endurance and scalable non-volatile memory device made from asymmetric Ta2O5−x/TaO2−x bilayer structures

TL;DR: This work demonstrates a TaO(x)-based asymmetric passive switching device with which it was able to localize resistance switching and satisfy all aforementioned requirements, and eliminates any need for a discrete transistor or diode in solving issues of stray leakage current paths in high-density crossbar arrays.
Journal ArticleDOI

Atomic structure of conducting nanofilaments in TiO2 resistive switching memory

TL;DR: In situ current-voltage and low-temperature conductivity measurements confirm that switching occurs by the formation and disruption of Ti(n)O(2n-1) (or so-called Magnéli phase) filaments, which will provide a foundation for unravelling the full mechanism of resistance switching in oxide thin films.
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