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Journal ArticleDOI

Thermal conductivity of silicon, germanium, III–V compounds and III–V alloys

P.D. Maycock
- 01 Mar 1967 - 
- Vol. 10, Iss: 3, pp 161-168
TLDR
In this paper, the thermal conductivities of mixed III-V compounds: indium arsenide-phosphide, gallium-indium arsenides and gallium antimonides are presented.
Abstract
The thermal conductivities as a function of temperature for silicon, germanium, gallium arsenide, indium phosphide, indium arsenide, indium antimonide, gallium phosphide, aluminum antimonide and gallium antimonide are presented. Also included are the thermal conductivities of the mixed III–V compounds: indium arsenide-phosphide, gallium-indium arsenide and gallium arsenide-phosphide. These data are derived from the publications listed in the bibliography and represent the author's selection of the “most probable” values. A brief phenomenological discussion of the mechanisms involved in thermal conduction is presented.

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Citations
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Journal ArticleDOI

A semi-numerical model for multi-emitter finger AlGaAs/GaAs HBTs

TL;DR: In this article, a semi-numerical model for the multiple-emitter finger heterojunction bipolar transistor (HBT) is presented, which consists of an analytical model applicable for the single-finger HBT and a numerical program which solves the three-dimensional heat transfer equations.
Journal ArticleDOI

Beam damage of single semiconductor nanowires during X-ray nanobeam diffraction experiments

TL;DR: To unveil the origin of radiation damage, a comparison was made of nanoprobe X-ray diffraction experiments carried out on individual semiconductor nanowires in their as-grown geometry both under ambient conditions and under He atmosphere at the microfocus station of the P08 beamline at the third-generation source PETRA III.
Book ChapterDOI

Thermal Analysis of Integrated Circuits

H. Rudolph, +1 more
TL;DR: In this paper, the thermal analysis of bipolar integrated circuits within the design phase is described, and the influence of self-heating and interaction thermals was simulated with special SPICE subcircuits.
Book ChapterDOI

Maskless Dry Etching of GaAs by Focused Laser Beam

TL;DR: There has been increasing interest in the application of laser beams to semiconductor processing such as etching and deposition, because of the potential for low temperature and maskless processes as discussed by the authors.
Journal ArticleDOI

Investigation of magnetic anisotropy and heat dissipation in thin films of compensated antiferromagnet CuMnAs by pump–probe experiment

TL;DR: In this paper, the authors used a magneto-optical pump and probe experiment to determine the easy axis position in a 10-nm-thick antiferromagnet CuMnAs.
References
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Journal Article

Thermal Conductivity of Silicon from 300 to 1400°K^*

H. R. Shanks
- 01 Jan 1963 - 
TL;DR: The thermal diffusivity of pure silicon has been measured from 300 to 1400 degrees K and the specific heat of the same material over the same temperature range was measured by Dennison.
Journal ArticleDOI

Thermal Conductivity: XIV, Conductivity of Multicomponent Systems

TL;DR: In this article, the thermal conductivity of a number of multi-component systems has been determined as a function of composition and temperature, and it was shown that a second component in solid solution markedly lowers thermal conductivities.
Journal ArticleDOI

Thermal Conductivity of GaAs and GaAs1−xPx Laser Semiconductors

TL;DR: In this article, thermal conductivity measurements for both pure and heavily doped n− and p−type GaAs single crystals were reported for the range 3° to 300°K, with a K less than 1/20 that of pure GaAs at 77°K.
Journal ArticleDOI

Thermal Conductivity and Thermoelectric Power of Germanium‐Silicon Alloys

TL;DR: In this paper, a series of germanium-silicon alloys were used for thermoelectric power measurement and it was shown that solid-solution alloying can significantly increase the figure of merit of the thermodynamic properties of these materials.
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