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Journal ArticleDOI

Use of Negative Capacitance to Provide Voltage Amplification for Low Power Nanoscale Devices

Sayeef Salahuddin, +1 more
- 01 Feb 2008 - 
- Vol. 8, Iss: 2, pp 405-410
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TLDR
By replacing the standard insulator with a ferroelectric insulator of the right thickness it should be possible to implement a step-up voltage transformer that will amplify the gate voltage thus leading to values of S lower than 60 mV/decade and enabling low voltage/low power operation.
Abstract
It is well-known that conventional field effect transistors (FETs) require a change in the channel potential of at least 60 mV at 300 K to effect a change in the current by a factor of 10, and this minimum subthreshold slope S puts a fundamental lower limit on the operating voltage and hence the power dissipation in standard FET-based switches. Here, we suggest that by replacing the standard insulator with a ferroelectric insulator of the right thickness it should be possible to implement a step-up voltage transformer that will amplify the gate voltage thus leading to values of S lower than 60 mV/decade and enabling low voltage/low power operation. The voltage transformer action can be understood intuitively as the result of an effective negative capacitance provided by the ferroelectric capacitor that arises from an internal positive feedback that in principle could be obtained from other microscopic mechanisms as well. Unlike other proposals to reduce S, this involves no change in the basic physics of the FET and thus does not affect its current drive or impose other restrictions.

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Citations
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Journal ArticleDOI

Tunnel field-effect transistors as energy-efficient electronic switches

TL;DR: Tunnels based on ultrathin semiconducting films or nanowires could achieve a 100-fold power reduction over complementary metal–oxide–semiconductor transistors, so integrating tunnel FETs with CMOS technology could improve low-power integrated circuits.
Patent

Semiconductor device, and manufacturing method thereof

TL;DR: In this article, the oxide semiconductor film has at least a crystallized region in a channel region, which is defined as a region of interest (ROI) for a semiconductor device.
Journal ArticleDOI

Low-Voltage Tunnel Transistors for Beyond CMOS Logic

TL;DR: This review introduces and summarizes progress in the development of the tunnel field- effect transistors (TFETs) including its origin, current experimental and theoretical performance relative to the metal-oxide-semiconductor field-effect transistor (MOSFET), basic current-transport theory, design tradeoffs, and fundamental challenges.
Journal ArticleDOI

Multigate transistors as the future of classical metal–oxide–semiconductor field-effect transistors

TL;DR: In the current generation of transistors, the transistor dimensions have shrunk to such an extent that the electrical characteristics of the device can be markedly degraded, making it unlikely that the exponential decrease in transistor size can continue.
Journal ArticleDOI

Incipient Ferroelectricity in Al-Doped HfO2 Thin Films

TL;DR: In this paper, a structural investigation of the electrically characterized capacitors by grazing incidence X-ray diffraction is presented in order to gain further insight on the potential origin of ferroelectricity.
References
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Journal ArticleDOI

Design challenges of technology scaling

Shekhar Borkar
- 01 Jul 1999 - 
TL;DR: In this article, the authors look closely at past trends in technology scaling and how well microprocessor technology and products have met these goals and project the challenges that lie ahead if these trends continue.
Journal ArticleDOI

Band-to-band tunneling in carbon nanotube field-effect transistors.

TL;DR: How the structure of the nanotube is the key enabler of this particular one-dimensional tunneling effect is discussed, which is controlled here by the valence and conduction band edges in a bandpass-filter-like arrangement.
Journal ArticleDOI

Limits to binary logic switch scaling - a gedanken model

TL;DR: This paper considers computational systems whose material realizations utilize electrons and energy barriers to represent and manipulate their binary representations of state.
Journal ArticleDOI

Double Hysteresis Loop of BaTi O 3 at the Curie Point

TL;DR: In this paper, it is shown that the shape of the hysteresis loop at temperatures slightly above the Curie point corresponds to the paraelectric state of BaTi.
Journal ArticleDOI

End of Moore's law: thermal (noise) death of integration in micro and nano electronics

TL;DR: The exponential growth of memory size and clock frequency in computers has a great impact on everyday life as discussed by the authors, and the growth is empirically described by Moore's law of miniaturization.
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