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Journal ArticleDOI

On the Charge Sheet Superjunction (CSSJ) MOSFET

TLDR
In this paper, a simple analytical model is developed for the drain-source capacitance of the charge sheet superjunction (CSSJ) MOSFET, and the model is shown to apply to the Superjunction as well.
Abstract
This paper provides more insight into the operation of the charge sheet superjunction (CSSJ) proposed recently, whose specific on-resistance for a given breakdown voltage is even lower than that of a Superjunction (SJ). It is shown how the SJ and the CSSJ both evolve from a simple Gamma-shaped p+-n junction in which the heavily doped region surrounds the lightly doped region; the peak field in such a 2-D junction is less than that in a plane junction. The phenomena underlying the I- V and C -V characteristics of the CSSJ MOSFET are clarified with the help of charge and potential simulations. A simple analytical model is developed for the drain-source capacitance of the CSSJ MOSFET; the model is shown to apply to SJ MOSFET as well. It is argued that the insulator charges providing the charge sheet essential for CSSJ operation will not present the same reliability problems as those due to trapped charge in the gate insulator of small-signal MOSFETs; this is because the insulator field distribution in a CSSJ differs significantly from that in a small-signal MOSFET. The insight provided in this paper should build a strong motivation for the practical implementation of the new structure.

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Citations
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Journal ArticleDOI

Gate Enhanced Power UMOSFET With Ultralow On-Resistance

TL;DR: In this paper, a gate enhanced power UMOSFET (GE-UMOS) was proposed to decrease the specific on-resistance of the device, where the deep trench polysilicon electrode is contacted to the gate electrode, maintaining the breakdown voltage and forming the high electron current density at side n-drift region, thus resulting in a lower on -resistance compared to the superjunction structure and gradient oxide-bypassed (GOB) structure.
Journal ArticleDOI

A Review of Superjunction Vertical Diffused MOSFET

TL;DR: Superjunction has arguably been the most creative and important concept in power device field Superjunction vertical diffused MOSFET (SJ VDMOS) has been commercialized and the research effort to l
Journal ArticleDOI

High-Performance Gate-Enhanced Power UMOSFET With Optimized Structure

TL;DR: In this article, an optimized gate-enhanced (GE) power UMOSFET with split gate (SGE-UMOS) was proposed, which shows the reduction in specific on-state resistance (Rsp) at a breakdown voltage of 119 V as compared to the gradient oxide-bypassed (GOB) UMOS and GE-UMMS devices, which is due to the higher N-type concentration in the drift region.
Journal ArticleDOI

Growth of Al2O3 thin film by oxidation of resistively evaporated Al on top of SnO2, and electrical properties of the heterojunction SnO2/Al2O3

TL;DR: In this paper, a simple device and electric circuit is proposed to measure the insulating properties of aluminum oxide and the transport properties of SnO2 as well, which indicate a fair insulation when four layers or Al2O3 are grown on the tin dioxide film, concomitant with thermal annealing.
Journal ArticleDOI

High-voltage and low specific on-resistance power UMOSFET using P and N type columns

TL;DR: In this paper, the authors presented the unique features exhibited by power 4H-SiC UMOSFET in which N and P type columns (NPC) in the drift region are incorporated to improve the breakdown voltage, the specific on-resistance, and the total lateral cell pitch.
References
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Journal ArticleDOI

Modeling of the CoolMOS/sup TM/ transistor - Part I: Device physics

TL;DR: In this paper, the authors present simulation results aimed at understanding the device operation both in the on state and in the off state, and they show that quasi saturation of the drain current can be prevented by increasing the doping density of the drift region.

Strong correlation between dielectric reliability and charge trapping in SiO2/Al2O3 gate stacks with TiN electrodes

TL;DR: In this article, the authors show that electron trap generation in the bulk of the Al2O3 film, yielding a strong thickness dependence of the beta values, as expected from the percolation model and as observed in SiO2 layers of similar thickness.
Journal ArticleDOI

Progressive Development of Superjunction Power MOSFET Devices

TL;DR: In this paper, detailed descriptions of the progressive development and the technical advancement of several superjunction (SJ) power MOSFET structures are presented with both simulation and experimental results.
Journal ArticleDOI

Origin of Vt instabilities in high-k dielectrics Jahn-Teller effect or oxygen vacancies

TL;DR: In this article, an analysis of the trapping in high dielectrics and its origin is given, and it is found that the defect is consistent with oxygen vacancies in monoclinic hafnia.
Journal ArticleDOI

Effects of Oxide-Fixed Charge on the Breakdown Voltage of Superjunction Devices

TL;DR: In this article, fixed charges present in oxide layers are shown to have the following influence on the device breakdown voltage: the effect of a positive fixed charge is equivalent to an increase in the n-pillar charge, and the resulting charge imbalance degrades Vbr, and can be compensated either by increasing the p-pillar doping or by decreasing the npillar doping by an amount ap(1.2NfT+4NfI)/(pillarwidth).
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