scispace - formally typeset
M

Mara Bruzzi

Researcher at University of Florence

Publications -  339
Citations -  5235

Mara Bruzzi is an academic researcher from University of Florence. The author has contributed to research in topics: Diamond & Silicon. The author has an hindex of 35, co-authored 323 publications receiving 4843 citations. Previous affiliations of Mara Bruzzi include Paris Descartes University & Brookhaven National Laboratory.

Papers
More filters
Journal ArticleDOI

Radiation hard silicon detectors—developments by the RD48 (ROSE) collaboration

G. Lindström, +139 more
TL;DR: In this paper, a defect engineering technique was employed resulting in the development of Oxygen enriched FZ silicon (DOFZ), ensuring the necessary O-enrichment of about 2×1017 O/cm3 in the normal detector processing.
Journal ArticleDOI

Developments for radiation hard silicon detectors by defect engineering—results by the CERN RD48 (ROSE) Collaboration

G. Lindström, +140 more
TL;DR: In this paper, the authors summarized the final results obtained by the RD48 collaboration, focusing on the more practical aspects directly relevant for LHC applications, including the changes of the effective doping concentration (depletion voltage) and the dependence of radiation effects on fluence, temperature and operational time.
Journal ArticleDOI

Ultra-fast silicon detectors

TL;DR: In this article, the authors proposed a fast, thin silicon sensor with gain capable to concurrently measure with high precision the space (∼10μm) and time ( ∼10ps) coordinates of a particle.
Journal ArticleDOI

Radiation damage in silicon detectors for high-energy physics experiments

TL;DR: In this article, the radiation effects in silicon detectors are discussed in view of their application in future high-energy physics experiments and major changes in the operational parameters due to radiation damage and their origin in the radiation-induced microscopic disorder in the silicon bulk.
Journal ArticleDOI

Minimum ionizing and alpha particles detectors based on epitaxial semiconductor silicon carbide

TL;DR: In this article, a 40/spl mu/m thick 4 H-SiC epitaxial layer with a low doping concentration of /spl sim/5/spl times/10/sup 13/ cm/sup -3/ was used in order to have a relatively high number of e-h pairs generated by a minimum ionizing particle (MIP) and to deplete the total active layer at relatively low reverse bias (60 V).