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Field-effect transistors and intrinsic mobility in ultra-thin MoSe2 layers

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TLDR
In this paper, the authors report the fabrication of back-gated field effect transistors (FETs) using ultra-thin, mechanically exfoliated MoSe2 flakes.
Abstract
We report the fabrication of back-gated field-effect transistors (FETs) using ultra-thin, mechanically exfoliated MoSe2 flakes. The MoSe2 FETs are n-type and possess a high gate modulation, with On/Off ratios larger than 106. The devices show asymmetric characteristics upon swapping the source and drain, a finding explained by the presence of Schottky barriers at the metal contact/MoSe2 interface. Using four-point, back-gated devices, we measure the intrinsic conductivity and mobility of MoSe2 as a function of gate bias, and temperature. Samples with a room temperature mobility of ∼ 50 cm2/V·s show a strong temperature dependence, suggesting phonons are a dominant scattering mechanism.

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Citations
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Journal ArticleDOI

Observation of Switchable Photoresponse of a Monolayer WSe2-MoS2 Lateral Heterostructure via Photocurrent Spectral Atomic Force Microscopic Imaging.

TL;DR: This work uses photocurrent spectral atomic force microscopy to image the current and photocurrent generated between a biased PtIr tip and a monolayer WSe2-MoS2 lateral heterostructure, and shows high spatial frequency variations in substrate/ MoS2 contact that exceed the frequencies imposed by the underlying substrates.
Journal ArticleDOI

High gain, low noise, fully complementary logic inverter based on bi-layer WSe2 field effect transistors

TL;DR: In this paper, high performance p-and n-type WSe2 field effect transistors (FETs) can be realized by contact work function engineering, electrostatic doping and proper scaling of both the oxide thickness and the flake thickness.
Journal ArticleDOI

Monolayer tellurene–metal contacts

TL;DR: In this article, the interfacial characteristics of monolayer (ML) tellurene field effect transistors with a series of common bulk metals and 2D graphene as electrodes were comprehensively examined.
Journal ArticleDOI

Imperfect two-dimensional topological insulator field-effect transistors

TL;DR: Two-dimensional topological insulator field-effect transistors that switch based on the modulation of scattering are proposed that can be made enabling high-performance and low-power electronic circuits using imperfect two-dimensionalTopological insulators.
Journal ArticleDOI

Interfacial Properties of Monolayer MoSe2–Metal Contacts

TL;DR: Using ab initio energy band calculations and more reliable ab-in-time quantum transport simulations, this paper studied the interfacial properties of ML MoSe2-metal interfaces (metals = Al, Ag, Pt, Cr, Ni, and Ti).
References
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Journal ArticleDOI

Electric Field Effect in Atomically Thin Carbon Films

TL;DR: Monocrystalline graphitic films are found to be a two-dimensional semimetal with a tiny overlap between valence and conductance bands and they exhibit a strong ambipolar electric field effect.
Journal ArticleDOI

Single-layer MoS2 transistors

TL;DR: Because monolayer MoS(2) has a direct bandgap, it can be used to construct interband tunnel FETs, which offer lower power consumption than classical transistors, and could also complement graphene in applications that require thin transparent semiconductors, such as optoelectronics and energy harvesting.
Journal ArticleDOI

Two-dimensional atomic crystals

TL;DR: By using micromechanical cleavage, a variety of 2D crystals including single layers of boron nitride, graphite, several dichalcogenides, and complex oxides are prepared and studied.
Journal ArticleDOI

The transition metal dichalcogenides discussion and interpretation of the observed optical, electrical and structural properties

J.A. Wilson, +1 more
- 01 May 1969 - 
TL;DR: The transition metal dichalcogenides are about 60 in number as discussed by the authors, and two-thirds of these assume layer structures and can be cleaved down to less than 1000 A and are then transparent in the region of direct band-to-band transitions.
Journal ArticleDOI

Intrinsic and extrinsic performance limits of graphene devices on SiO2.

TL;DR: It is shown that electron-acoustic phonon scattering is indeed independent of n, and contributes only 30 Omega to graphene's room-temperature resistivity, and its magnitude, temperature dependence and carrier-density dependence are consistent with extrinsic scattering by surface phonons at the SiO2 substrate.
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