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Journal ArticleDOI

High-temperature electronics - a role for wide bandgap semiconductors?

P. G. Neudeck, +2 more
- Vol. 90, Iss: 6, pp 1065-1076
TLDR
It appears unlikely that wide bandgap semiconductor devices will find much use in low-power transistor applications until the ambient temperature exceeds approximately 300/spl deg/C, as commercially available silicon and silicon-on-insulator technologies are already satisfying requirements for digital and analog VLSI in this temperature range.
Abstract
The fact that wide bandgap semiconductors are capable of electronic functionality at much higher temperatures than silicon has partially fueled their development, particularly in the case of SiC. It appears unlikely that wide bandgap semiconductor devices will find much use in low-power transistor applications until the ambient temperature exceeds approximately 300/spl deg/C, as commercially available silicon and silicon-on-insulator technologies are already satisfying requirements for digital and analog VLSI in this temperature range. However practical operation of silicon power devices at ambient temperatures above 200/spl deg/C appears problematic, as self-heating at higher power levels results in high internal junction temperatures and leakages. Thus, most electronic subsystems that simultaneously require high-temperature and high-power operation will necessarily be realized using wide bandgap devices, once they become widely available. Technological challenges impeding the realization of beneficial wide bandgap high ambient temperature electronics, including material growth, contacts, and packaging, are briefly discussed.

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Citations
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Journal ArticleDOI

Perovskite lead-free dielectrics for energy storage applications

TL;DR: In this paper, the authors summarize the principles of dielectric energy-storage applications, and recent developments on different types of Dielectrics, namely linear dielectrics (LDE), paraelectric, ferroelectrics, and antiferro electrics, focusing on perovskite lead-free dielectors.
Journal ArticleDOI

Ultrawide-Bandgap Semiconductors: Research Opportunities and Challenges

TL;DR: The UWBG semiconductor materials, such as high Al‐content AlGaN, diamond and Ga2O3, advanced in maturity to the point where realizing some of their tantalizing advantages is a relatively near‐term possibility.
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Electroceramics for High-Energy Density Capacitors: Current Status and Future Perspectives

TL;DR: In this article, the fundamental principles of energy storage in dielectric capacitors are introduced and a comprehensive review of the state-of-the-art is presented. But the authors do not consider the use of lead-free materials in high-temperature applications, since their toxicity raises concern over their use in consumer applications.
Journal ArticleDOI

Low-Temperature Sintered Nanoscale Silver as a Novel Semiconductor Device-Metallized Substrate Interconnect Material

TL;DR: In this article, a nanoscale silver paste containing 30-nm silver particles that can be sintered at 280degC was made for interconnecting semiconductor devices, which produced a microstructure containing micrometer-size porosity and relative density of around 80%.
Journal ArticleDOI

Silicon carbide and diamond for high temperature device applications

TL;DR: The physical and chemical properties of wide bandgap semiconductors silicon carbide and diamond make these materials an ideal choice for device fabrication for applications in many different areas, e.g. light emitters, high temperature and high power electronics, high power microwave devices, micro-electromechanical system (MEMS) technology, and substrates as mentioned in this paper.
References
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Proceedings Article

Physics of semiconductor devices

S. M. Sze
Book

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TL;DR: In this article, a review of the present knowledge of metal-semiconductor contacts is given, including the factors that determine the height of the Schottky barrier, its current/voltage characteristics, and its capacitance.
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Gan : processing, defects, and devices

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Journal ArticleDOI

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TL;DR: This paper reviews the various trapping phenomena observed in SiC- and GaN-based FETs that contribute to compromised power performance and the measurement techniques utilized to identify these traps.
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