Journal ArticleDOI
Intrinsic stress in sputter-deposited thin films
TLDR
A review of the sputtered film stress literature shows that the intrinsic stress can be tensile or compressive depending on the energetics of the deposition process as discussed by the authors, and extensive experimental evidence show a direct link between the particle flux and energy striking the condensing film, which determines the nature and magnitude of the stress.Abstract:
A review of the sputtered film stress literature shows that the intrinsic stress can be tensile or compressive depending on the energetics of the deposition process. Modeling studies of film growth and extensive experimental evidence show a direct link between the energetics of the deposition process and film microstructure, which in turn determines the nature and magnitude of the stress. The fundamental quantities are the particle flux and energy striking the condensing film, which are a function of many process parameters such as pressure (discharge voltage), target/sputtering gas mass ratio, cathode shape, bias voltage, and substrate orientation. Tensile stress is generally observed in zone 1-type, porous films and is explained in terms of the grain boundary relaxation model, whereas compressive stress, observed in zone T-type, dense films, is interpreted in terms of the atomic peening mechanism. Modeling of the atomic peening mechanism and experimental data indicate that the normalized moment...read more
Citations
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Journal ArticleDOI
High power pulsed magnetron sputtering: A review on scientific and engineering state of the art
TL;DR: High power pulsed magnetron sputtering (HPPMS) is an emerging technology that has gained substantial interest among academics and industrials alike as discussed by the authors, also known as HIPIMS (high power impulse...
Book
Handbook of physical vapor deposition (PVD) processing
TL;DR: Physical vapor deposition (PVD) process technology from the characterizing and preparing the substrate material, through deposition processing and film characterization, to post-deposition processing is discussed in this paper.
Journal ArticleDOI
Crystallite coalescence: A mechanism for intrinsic tensile stresses in thin films
William D. Nix,Bruce M. Clemens +1 more
TL;DR: In this paper, the authors examined the stress associated with crystallite coalescence during the initial stages of growth in thin polycrystalline films with island growth morphology and predicted large tensile stresses in agreement with experimental results.
Journal ArticleDOI
Review of advances in cubic boron nitride film synthesis
TL;DR: A review of recent developments in BN film synthesis and characterization can be found in this paper, where the key experimental parameters controlling cBN film formation and synthesis techniques are discussed and the proposed mechanisms of cBN formation and the observed mechanical and electrical properties of CBN films are analyzed.
Journal ArticleDOI
Design and evaluation of tribological coatings
TL;DR: The use of coatings to improve the tribological properties of components such as tools for metal cutting and forming, and machine elements e.g. sliding bearings, seals and valves is constantly increasing.
References
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Journal ArticleDOI
Effects of argon pressure and substrate temperature on the structure and properties of sputtered copper films
S. Craig,G. L. Harding +1 more
TL;DR: In this article, the influence of substrate temperature and sputter gas pressure on the evolution of coating morphology during growth of magnetron deposited copper films has been investigated for film thicknesses up to 10 μm.
Journal ArticleDOI
Thin film annealing by ion bombardment
E.H. Hirsch,I.K. Varga +1 more
TL;DR: In this paper, the effect of argon ion bombardment during the evaporation procedure was studied experimentally, and it was shown that the small amount incorporated into the film by the bombardment is shown to have no significant influence on the process.
Journal ArticleDOI
Higher nitrides of hafnium, zirconium, and titanium synthesized by dual ion beam deposition
TL;DR: In this paper, the preparation and properties of higher nitrides of Hf, Zr, and Ti synthesized by dual ion beam deposition are reported and evidence is given for the existence of a metastable higher nitride phase with composition of approximately Hf3 N4 and Zr3N4.
Journal ArticleDOI
Stress and microstructure in tungsten sputtered thin films
TL;DR: In this article, the authors investigated film stresses as a function of substrate temperature and background pressure in connection with microstructural observations and limited compositional analysis, and showed that film stresses increased from zero towards tensile values as voids disappeared.
Journal ArticleDOI
The Origin of Stress in Metal Layers Condensed from the Vapour in High Vacuum
H.P. Murbach,H. Wilman +1 more
TL;DR: In this paper, the authors made measurements of the stress in deposits of Ni, Fe, Pd, Au, Cu, Ag, Sb, Al, Bi, Mg and Zn.