Journal ArticleDOI
Intrinsic stress in sputter-deposited thin films
TLDR
A review of the sputtered film stress literature shows that the intrinsic stress can be tensile or compressive depending on the energetics of the deposition process as discussed by the authors, and extensive experimental evidence show a direct link between the particle flux and energy striking the condensing film, which determines the nature and magnitude of the stress.Abstract:
A review of the sputtered film stress literature shows that the intrinsic stress can be tensile or compressive depending on the energetics of the deposition process. Modeling studies of film growth and extensive experimental evidence show a direct link between the energetics of the deposition process and film microstructure, which in turn determines the nature and magnitude of the stress. The fundamental quantities are the particle flux and energy striking the condensing film, which are a function of many process parameters such as pressure (discharge voltage), target/sputtering gas mass ratio, cathode shape, bias voltage, and substrate orientation. Tensile stress is generally observed in zone 1-type, porous films and is explained in terms of the grain boundary relaxation model, whereas compressive stress, observed in zone T-type, dense films, is interpreted in terms of the atomic peening mechanism. Modeling of the atomic peening mechanism and experimental data indicate that the normalized moment...read more
Citations
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Journal ArticleDOI
High power pulsed magnetron sputtering: A review on scientific and engineering state of the art
TL;DR: High power pulsed magnetron sputtering (HPPMS) is an emerging technology that has gained substantial interest among academics and industrials alike as discussed by the authors, also known as HIPIMS (high power impulse...
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Handbook of physical vapor deposition (PVD) processing
TL;DR: Physical vapor deposition (PVD) process technology from the characterizing and preparing the substrate material, through deposition processing and film characterization, to post-deposition processing is discussed in this paper.
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Crystallite coalescence: A mechanism for intrinsic tensile stresses in thin films
William D. Nix,Bruce M. Clemens +1 more
TL;DR: In this paper, the authors examined the stress associated with crystallite coalescence during the initial stages of growth in thin polycrystalline films with island growth morphology and predicted large tensile stresses in agreement with experimental results.
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Review of advances in cubic boron nitride film synthesis
TL;DR: A review of recent developments in BN film synthesis and characterization can be found in this paper, where the key experimental parameters controlling cBN film formation and synthesis techniques are discussed and the proposed mechanisms of cBN formation and the observed mechanical and electrical properties of CBN films are analyzed.
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Design and evaluation of tribological coatings
TL;DR: The use of coatings to improve the tribological properties of components such as tools for metal cutting and forming, and machine elements e.g. sliding bearings, seals and valves is constantly increasing.
References
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Journal ArticleDOI
Internal stresses in amorphous silicon films depositied by cylindrical magnetron sputtering using Ne, Ar, Kr, Xe, and Ar+H2
J. A. Thornton,D. W. Hoffman +1 more
TL;DR: In this article, the authors reported the occurrence of stress transitions in amorphous silicon films formed by dc cylindrical magnetron sputtering from a P-doped Si target using Ne, Ar, Kr, Xe, and Ar+H2 as working gases.
Journal ArticleDOI
Reflection of Heavy Ions
Wolfgang Eckstein,J.P. Biersack +1 more
TL;DR: In this article, the backscattering of heavy ions from surfaces is investigated by computer simulation (TRIM) and the particle and energy reflection coefficients are shown to scale with the ratio of target mass to ion mass as well as with the reduced energy e for e>0.02 and for normal incidence.
Journal ArticleDOI
Substrate heating rates for planar and cylindrical-post magnetron sputtering sources
John A. Thornton,James L. Lamb +1 more
TL;DR: In this article, the authors examined the contributions to substrate heating of plasma species and ion neutralization and reflection at the cathode in planar and cylindrical magnetron sputtering.
Journal ArticleDOI
Mechanical properties of optical films
TL;DR: In this article, it was shown that the intrinsic tensile stresses of the growing films reached a maximum between 5 and 15 nm at a stage when the last holes in the island microstructure of the films were filling up.
Journal ArticleDOI
Effect of silane dilution on intrinsic stress in glow discharge hydrogenated amorphous silicon films
TL;DR: In this article, the intrinsic stress in hydrogenated amorphous silicon films grown by rf glow discharge decomposition of silane diluted to varying degrees in argon is measured and a model of diffusive incorporation of hydrogen or some gaseous impurity during growth into the bulk of the film behind the growing interface is proposed to explain the results.