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Journal ArticleDOI

Proton radiation effects in 0.35 /spl mu/m partially depleted SOI MOSFETs fabricated on UNIBOND

TLDR
In this article, the proton radiation tolerance of a 035 /spl mu/m SOI technology on UNIBOND material was investigated and the radiation response was characterized by threshold-voltage shifts of the front-gate and back-gate transistors.
Abstract
We investigate the proton radiation tolerance of a 035 /spl mu/m SOI technology on UNIBOND material The radiation response is characterized by threshold-voltage shifts of the front-gate and back-gate transistors An increase of the front-gate threshold voltage is observed on the n-channel MOSFETs after irradiation and is attributed to radiation-induced interface states at the front-gate oxide/silicon interface A double g/sub m/ peak behavior is observed on the back-gate g/sub m/-V/sub GS/ curves for both n- and p-channel MOSFETs and is attributed to silicon/back-gate oxide interface traps with a delta-function-like distribution in the energy gap The results suggest this 035 /spl mu/m technology on UNIBOND material performs well in a proton-radiation environment

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Journal ArticleDOI

Total ionizing dose damage in deep submicron partially depleted SOI MOSFETs induced by proton irradiation

TL;DR: In this article, the impact of ionizing irradiation on the static, transient and low-frequency noise characteristics of deep submicron partially depleted (PD) silicon-on-insulator (SOI) transistors is discussed.
Journal ArticleDOI

Impact of 7.5-MeV proton irradiation on front-back gate coupling effect in ultra thin gate oxide FD-SOI n-MOSFETs

TL;DR: In this paper, the degradation of deep submicron (0.1 /spl mu/m) fully depleted (FD)-silicon-on-insulator (SOI) n-channel metal oxide semiconductor field effect transistors (MOSFETs) subjected to 7.5-MeV proton irradiation is reported.
Journal ArticleDOI

The effect of charge collection recovery in silicon p–n junction detectors irradiated by different particles

TL;DR: In this paper, the Lazarus effect was studied in Si detectors irradiated by fast reactor neutrons, by protons of medium and high energy, by pions and by gamma-rays.
Journal ArticleDOI

The Enhanced Role of Shallow-Trench Isolation in Ionizing Radiation Damage of 65 nm RF-CMOS on SOI

TL;DR: In this paper, the authors analyzed the effects of shallow-trench isolation on ionizing radiation response of 65 nm Silicon-On-Insulator (SOI) CMOS technology and showed that body-contacting schemes which eliminate sidewalls (e.g., H-body, T-body) will provide the necessary total-dose radiation tolerance for multi-finger analog and RF devices, without additional hardening techniques.
Journal ArticleDOI

Accurate Monte Carlo modeling and performance assessment of the X-PET subsystem of the FLEX triumph preclinical PET/CT scanner.

TL;DR: The developed MC simulation platform provides a reliable tool for performance evaluation of small animal PET scanners and has the potential to be used in other applications such as detector design optimization, correction of image degrading factors such as randoms, scatter, intercrystal scatter, parallax error, and partial volume effect.
References
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Journal ArticleDOI

Silicon on insulator material technology

M. Bruel
- 06 Jul 1995 - 
TL;DR: In this article, a silicon on insulator material technology based on wafer bonding is described, in which a heat treatment induces an in-depth microslicing of one of the two bonded wafers previously implanted with hydrogen.
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Challenges in hardening technologies using shallow-trench isolation

TL;DR: In this article, the authors explored the use of device simulations in concert with measurements on test structures to provide detailed physical insight into methods for improving total-dose radiation response and demonstrated the successful conversion of a non-radiation hardened technology with LOCOS isolation (Sandia's CMOS6) into a greater than 1 Mrad(SiO/sub 2/) radiation-hardened shallow-trench isolated technology.
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Worst-case bias during total dose irradiation of SOI transistors

TL;DR: In this article, the worst case bias during total dose irradiation of partially depleted SOI transistors from two technologies is correlated to the device architecture, and experiments and simulations are used to analyze SOI back transistor threshold voltage shift and charge trapping in the buried oxide.
Journal ArticleDOI

Particle-induced bit errors in high performance fiber optic data links for satellite data management

TL;DR: In this article, the effect of particle-induced bit errors on fiber optic link receivers for satellites is quantified by analyzing proton and helium ion data as a function of particle LET, and an analytic model is described which incorporates the appropriate physical characteristics of the link as well as the optical and receiver electrical characteristics.
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A total resistance slope-based effective channel mobility extraction method for deep submicrometer CMOS technology

TL;DR: In this article, a simple total resistance slope-based method for channel mobility extraction in deep submicrometer CMOS technology is developed, where the series resistance is removed from the measured total resistance, and mobility is extracted without involving the effective channel length.
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