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Open AccessJournal ArticleDOI

Reduced Lasing Thresholds in GeSn Microdisk Cavities with Defect Management of the Optically Active Region

TLDR
GeSn alloys are nowadays considered as the most promising materials to build Group IV laser sources on silicon (Si) in a full complementary metal oxide semiconductor compatible approach.
Abstract
GeSn alloys are nowadays considered as the most promising materials to build Group IV laser sources on silicon (Si) in a full complementary metal oxide semiconductor-compatible approach. Recent GeS...

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Citations
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Journal ArticleDOI

Review of Si-Based GeSn CVD Growth and Optoelectronic Applications

TL;DR: In this article, a review of the recent progress in GeSn CVD growth is presented, including ion implantation, in situ doping technology, and ohmic contacts, GeSn detectors, Gesn transistors, and GeSn transistors.
Journal ArticleDOI

Strain-relaxed GeSn-on-Insulator (GeSnOI) microdisks

TL;DR: In this paper, a dual insulator GeSn-on-insulator (GeSnOI) material platform was developed to produce strain-relaxed GeSn microdisks stuck on a substrate, which achieved three key properties for a highperformance GeSn laser: removal of harmful compressive strain, decent thermal management, and excellent optical confinement.
Journal ArticleDOI

Enhanced GeSn Microdisk Lasers Directly Released on Si

TL;DR: In this paper, a strain-free GeSn microdisk laser device fully released on Si outperforms the canonical suspended devices, allowing to simultaneously relax the limiting compressive strain while offering excellent thermal conduction.
Journal ArticleDOI

GeSnOI mid-infrared laser technology

TL;DR: In this paper, a specific GeSn-on-insulator (GeSnOI) stack using stressor layers as dielectric optical claddings is demonstrated to be suitable for a monolithically integration of planar Group-IV semiconductor lasers on a versatile photonic platform for the near and mid-infrared spectral range.
References
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Journal ArticleDOI

Lasing in direct-bandgap GeSn alloy grown on Si

TL;DR: In this paper, a direct bandgap GeSn alloy, grown directly onto Si(001), was used for experimentally demonstrating lasing threshold and linewidth narrowing at low temperatures.
Journal ArticleDOI

Achieving direct band gap in germanium through integration of Sn alloying and external strain

TL;DR: In this paper, a theoretical model was developed based on the nonlocal empirical pseudopotential method to determine the electronic band structure of germanium tin (GeSn) alloys, and modifications to the virtual crystal potential accounting for disorder induced potential fluctuations were incorporated to reproduce the large direct band gap bowing observed in GeSn alloys.
Journal ArticleDOI

Increased photoluminescence of strain-reduced, high-Sn composition Ge1−xSnx alloys grown by molecular beam epitaxy

TL;DR: In this paper, the authors synthesize up to Ge0.914Sn0.086 alloys on (100) GaAs/InyGa1−yAs buffer layers using molecular beam epitaxy.
Journal ArticleDOI

Band structure and optical gain of tensile-strained germanium based on a 30 band k⋅p formalism

TL;DR: In this paper, the authors investigated the band structure of tensile-strained germanium using a 30 band k⋅p formalism and obtained that the crossover from indirect to direct band gap occurs for a tensile in-plane strain of 1.9%.
Journal ArticleDOI

Optically Pumped GeSn Microdisk Lasers on Si

TL;DR: In this paper, a group IV microdisk laser with significant improvements in lasing temperature and lasing threshold compared to the previously reported nonundercut Fabry-Perot type lasers is presented.
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