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Open AccessJournal ArticleDOI

Analytical Modeling and Experimental Validation of Threshold Voltage in BSIM6 MOSFET Model

TLDR
In this article, an analytical model of threshold voltage for bulk MOSFETs is developed, which is derived from the physical charge-based core of BSIM6 model, taking into account short channel effects, and is used in commercial SPICE simulators for operating point information.
Abstract
In this paper, an analytical model of threshold voltage for bulk MOSFET is developed. The model is derived from the physical charge-based core of BSIM6 MOSFET model, taking into account short channel effects, and is intended to be used in commercial SPICE simulators for operating point information. The model is validated with measurement data from IBM 90-nm technology node using various popular threshold voltage extraction techniques, and good agreement is obtained.

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Citations
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Journal ArticleDOI

BSIM-HV: High-Voltage MOSFET Model Including Quasi-Saturation and Self-Heating Effect

TL;DR: In this article, a BSIM-based compact model for a high-voltage MOSFET is presented, which has been extended to include the overlap capacitance due to the drift region as well as quasi-saturation effect.
Journal ArticleDOI

Analytical Modeling of Flicker Noise in Halo Implanted MOSFETs

TL;DR: An improved analytical model for flicker noise in MOSFETs is presented in this paper, which captures the effect of high-trap density in the halo regions of the devices.
Journal ArticleDOI

Modeling of Subsurface Leakage Current in Low $V_{\mathrm {TH}}$ Short Channel MOSFET at Accumulation Bias

TL;DR: In this article, a phenomenological model for subsurface leakage current in MOSFETs biased in accumulation is presented, which takes drain-to-source voltage, gate-tosource voltage and gate length into account.
Journal ArticleDOI

Anomalous Transconductance in Long Channel Halo Implanted MOSFETs: Analysis and Modeling

TL;DR: An analytical model, based on the equivalent conductance of the halo device, is developed to understand the anomalous behavior of transconductance in halo implanted MOSFET for linear and saturation regions across both gate and body biases.
Journal ArticleDOI

Analysis and Modeling of Temperature and Bias Dependence of Current Mismatch in Halo-Implanted MOSFETs

TL;DR: In this paper, an analytical model that accurately captures anomalous matching characteristics of drain current in a halo-implanted MOSFET across bias, geometry, and temperature is presented.
References
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Journal ArticleDOI

HiSIM2: Advanced MOSFET Model Valid for RF Circuit Simulation

TL;DR: In this paper, the authors proposed the HiSIM model, which solves the channel surface potentials with an efficient physically correct iteration procedure, thus avoiding additional approximations without any computer run-time penalty.
Journal ArticleDOI

BSIM6: Analog and RF Compact Model for Bulk MOSFET

TL;DR: The BSIM6 model has been extensively validated with industry data from 40-nm technology node and shows excellent source-drain symmetry during both dc and small signal analysis, thus giving excellent results during analog and RF circuit simulations.
Proceedings ArticleDOI

Modeling of pocket implanted MOSFETs for anomalous analog behavior

TL;DR: In this article, the first physical model of drain-induced threshold voltage shift and low output resistance to long channel devices is proposed and verified against data from a 018 /spl mu/m technology.
Journal ArticleDOI

A simple and unambiguous definition of threshold voltage and its implications in deep-submicron MOS device modeling

TL;DR: A new definition of MOSFET threshold voltage is proposed, namely, the "critical-current at linear-threshold" method, which has a unique solution and is very simple to measure.
Proceedings ArticleDOI

Threshold voltage extraction methods for MOS transistors

TL;DR: In this article, the authors compared several largely applied threshold voltage extraction methods used both for long channel and short channel MOSFETs, using MATHCAD designed programs.
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