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Proceedings ArticleDOI

Modeling and design considerations for negative capacitance field-effect transistors

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TLDR
In this article, the authors extended the Landau model to describe more than one domain, and showed how an internal metal electrode inherently destabilizes negative capacitance (NC) in a transistor gate stack.
Abstract
Stabilization of ferroelectric negative capacitance (NC) in a transistor gate stack is a promising pathway towards future low power electronics. However, most modeling efforts of such NCFETs are based on single-domain Landau theory, which is an oversimplification that leads to incorrect predictions and device design. By extending the Landau model to describe more than one domain, it is shown how an internal metal electrode inherently destabilizes NC. Consequently, NCFETs have to be designed without internal metal electrode to function. Furthermore, the use of single-domain Landau theory to model NCFETs with HfO 2 based ferroelectrics is critically discussed.

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Citations
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Journal ArticleDOI

Physical Insights on Negative Capacitance Transistors in Nonhysteresis and Hysteresis Regimes: MFMIS Versus MFIS Structures

TL;DR: In this paper, a comprehensive comparison of the two different types of ferroelectric negative capacitance FET (NCFET) structures, namely metal-ferroelectric-metal-insulator-semiconductor (MFMIS) and metal-FERO-INSIS (MFIS), is presented.
Journal ArticleDOI

Negative Capacitance Transistor to Address the Fundamental Limitations in Technology Scaling: Processor Performance

TL;DR: This paper investigates how the NCFET technology can open the doors not only for the continuation of Moore's law, which is approaching its end, but also for reviving Dennard’s scaling, which stopped more than a decade ago.
Journal ArticleDOI

Experimental Observation and Simulation Model for Transient Characteristics of Negative-Capacitance in Ferroelectric HfZrO 2 Capacitor

TL;DR: In this paper, the negative-capacitance transient effect in a ferroelectric HfZrO2 (FE-HZO) capacitor and an equivalent circuit model based on the Landau-Khalatnikov (LK) theory was developed.
References
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Journal ArticleDOI

Use of Negative Capacitance to Provide Voltage Amplification for Low Power Nanoscale Devices

TL;DR: By replacing the standard insulator with a ferroelectric insulator of the right thickness it should be possible to implement a step-up voltage transformer that will amplify the gate voltage thus leading to values of S lower than 60 mV/decade and enabling low voltage/low power operation.
Journal ArticleDOI

Ferroelectricity in hafnium oxide thin films

TL;DR: In this paper, it was shown that crystalline phases with ferroelectric behavior can be formed in thin thin films of SiO2 doped hafnium oxide, which is suitable for field effect transistors and capacitors due to its excellent compatibility to silicon technology.
Journal ArticleDOI

Ferroelectricity in Simple Binary ZrO2 and HfO2

TL;DR: A structural investigation revealed the orthorhombic phase to be of space group Pbc2(1), whose noncentrosymmetric nature is deemed responsible for the spontaneous polarization in this novel, nanoscale ferroelectrics.
Journal ArticleDOI

Negative capacitance in a ferroelectric capacitor.

TL;DR: In this paper, negative capacitance in a thin epitaxial ferroelectric film was observed to decrease with time, in exactly the opposite direction to which voltage for a regular capacitor should change.
Journal ArticleDOI

Tunnel Field-Effect Transistors: State-of-the-Art

TL;DR: In this paper, the development of tunnel field-effect transistors (TFETs) is reviewed by comparing experimental results and theoretical predictions against 16-nm FinFET CMOS technology.
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